Inventor
LANUCHA JOSEPH
US4 patents
Patents
4 patentsUS5456796AOct 10, 1995
Control of particle generation within a reaction chamber
APPLIED MATERIALS INC68 citations95
US5423918AJun 13, 1995
Method for reducing particulate contamination during plasma processing of semiconductor devices
APPLIED MATERIALS INC37 citations92
US5410122AApr 25, 1995
Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers
APPLIED MATERIALS INC36 citations92
US5622595AApr 22, 1997
Reducing particulate contamination during semiconductor device processing
APPLIED MATERIALS INC32 citations91