Inventor
MINTZ DONALD M
US15 patents
⚠️ This page may combine multiple inventors who share the name “MINTZ DONALD M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS5849136ADec 15, 1998
High frequency semiconductor wafer processing apparatus and method
APPLIED MATERIALS INC188 citations99
US5618382AApr 8, 1997
High-frequency semiconductor wafer processing apparatus and method
APPLIED MATERIALS INC125 citations99
US5391275AFeb 21, 1995
Method for preparing a shield to reduce particles in a physical vapor deposition chamber
APPLIED MATERIALS INC131 citations97
US5762748AJun 9, 1998
Lid and door for a vacuum chamber and pretreatment therefor
APPLIED MATERIALS INC56 citations95
US5401319AMar 28, 1995
Lid and door for a vacuum chamber and pretreatment therefor
APPLIED MATERIALS INC69 citations95
US5223457AJun 29, 1993
High-frequency semiconductor wafer processing method using a negative self-bias
APPLIED MATERIALS INC115 citations95
US6162297ADec 19, 2000
Embossed semiconductor fabrication parts
APPLIED MATERIALS INC59 citations93
US5202008AApr 13, 1993
Method for preparing a shield to reduce particles in a physical vapor deposition chamber
APPLIED MATERIALS INC147 citations93
US5565058AOct 15, 1996
Lid and door for a vacuum chamber and pretreatment therefor
APPLIED MATERIALS INC27 citations92
US6418960B1Jul 16, 2002
Ultrasonic enhancement for solvent purge of a liquid delivery system
APPLIED MATERIALS INC35 citations90
VARIAN ASSOCIATES
5 patentsUS4865712ASep 12, 1989
Apparatus for manufacturing planarized aluminum films
VARIAN ASSOCIATES94 citations96
US4661228AApr 28, 1987
Apparatus and method for manufacturing planarized aluminum films
VARIAN ASSOCIATES94 citations96
US4595482AJun 17, 1986
Apparatus for and the method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges
VARIAN ASSOCIATES60 citations96
US4657654AApr 14, 1987
Targets for magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges
VARIAN ASSOCIATES29 citations92
US4627904ADec 9, 1986
Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias
VARIAN ASSOCIATES21 citations82