P

Inventor

NG CHE-HOO

US23 patents
⚠️ This page may combine multiple inventors who share the name “NG CHE-HOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

22 patents
US6445030B1Sep 3, 2002

Flash memory erase speed by fluorine implant or fluorination

ADVANCED MICRO DEVICES INC212 citations99
US6503801B1Jan 7, 2003

Non-uniform channel profile via enhanced diffusion

ADVANCED MICRO DEVICES INC125 citations97
US6514833B1Feb 4, 2003

Method of inhibiting lateral diffusion between adjacent wells by introducing carbon or fluorine ions into bottom of STI groove

ADVANCED MICRO DEVICES INC34 citations92
US6229177B1May 8, 2001

Semiconductor with laterally non-uniform channel doping profile

ADVANCED MICRO DEVICES INC16 citations92
US6136674AOct 24, 2000

Mosfet with gate plug using differential oxide growth

ADVANCED MICRO DEVICES INC42 citations92
US6074937AJun 13, 2000

End-of-range damage suppression for ultra-shallow junction formation

ADVANCED MICRO DEVICES INC37 citations92
US6008098ADec 28, 1999

Ultra shallow junction formation using amorphous silicon layer

ADVANCED MICRO DEVICES INC36 citations92
US5940735AAug 17, 1999

Reduction of charge loss in nonvolatile memory cells by phosphorus implantation into PECVD nitride/oxynitride films

ADVANCED MICRO DEVICES INC24 citations92
US5876903AMar 2, 1999

Virtual hard mask for etching

ADVANCED MICRO DEVICES INC43 citations92
US6756600B2Jun 29, 2004

Ion implantation with improved ion source life expectancy

ADVANCED MICRO DEVICES INC42 citations91
US6452198B1Sep 17, 2002

Minimized contamination of semiconductor wafers within an implantation system

ADVANCED MICRO DEVICES INC21 citations91
US6232048B1May 15, 2001

Method for preparing narrow photoresist lines

ADVANCED MICRO DEVICES INC18 citations90
US6624037B2Sep 23, 2003

XE preamorphizing implantation

ADVANCED MICRO DEVICES INC13 citations77
US6806147B1Oct 19, 2004

Method and apparatus for suppressing the channeling effect in high energy deep well implantation

ADVANCED MICRO DEVICES INC8 citations74
US6459141B2Oct 1, 2002

Method and apparatus for suppressing the channeling effect in high energy deep well implantation

ADVANCED MICRO DEVICES INC11 citations74
US5841179ANov 24, 1998

Conductive layer with anti-reflective surface portion

ADVANCED MICRO DEVICES INC8 citations74
US6380041B1Apr 30, 2002

Semiconductor with laterally non-uniform channel doping profile and manufacturing method therefor

ADVANCED MICRO DEVICES INC12 citations73
US6235636B1May 22, 2001

Resist removal by polishing

ADVANCED MICRO DEVICES INC5 citations63
US6191012B1Feb 20, 2001

Method for forming a shallow junction in a semiconductor device using antimony dimer

ADVANCED MICRO DEVICES INC5 citations63
US6146944ANov 14, 2000

Large angle implantation to prevent field turn-on under select gate transistor field oxide region for non-volatile memory devices

ADVANCED MICRO DEVICES INC3 citations63
US6087255AJul 11, 2000

Conductive layer with anti-reflective surface portion

ADVANCED MICRO DEVICES INC2 citations63
US6642152B1Nov 4, 2003

Method for ultra thin resist linewidth reduction using implantation

ADVANCED MICRO DEVICES INC6 citations60

ADVANCED MIRCO DEVICES INC

1 patent