P

Inventor

ITO SHINICHI

JP314 patents
⚠️ This page may combine multiple inventors who share the name “ITO SHINICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

25 patents
US6550990B2Apr 22, 2003

Substrate processing apparatus and processing method by use of the apparatus

TOSHIBA KK75 citations98
US5538815AJul 23, 1996

Method for designing phase-shifting masks with automatization capability

TOSHIBA KK183 citations98
US6376139B1Apr 23, 2002

Control method for exposure apparatus and control method for semiconductor manufacturing apparatus

TOSHIBA KK70 citations96
US6265323B1Jul 24, 2001

Substrate processing method and apparatus

TOSHIBA KK54 citations96
US6231917B1May 15, 2001

Method of forming liquid film

TOSHIBA KK49 citations96
US6165692ADec 26, 2000

Method for manufacturing a semiconductor device and an exposure mask used therefor

TOSHIBA KK62 citations96
US6072162AJun 6, 2000

Device and method for heating substrate, and method for treating substrate

TOSHIBA KK66 citations96
US5514499AMay 7, 1996

Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same

TOSHIBA KK43 citations96
US7524618B2Apr 28, 2009

Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof

TOSHIBA KK17 citations93
US6660091B2Dec 9, 2003

Apparatus for forming liquid film

TOSHIBA KK21 citations93
US6579382B2Jun 17, 2003

Chemical liquid processing apparatus for processing a substrate and the method thereof

TOSHIBA KK25 citations93
US6475285B2Nov 5, 2002

Deposition apparatus

TOSHIBA KK25 citations93
US6423977B1Jul 23, 2002

Pattern size evaluation apparatus

TOSHIBA KK37 citations93
US6410080B1Jun 25, 2002

Method for forming a liquid film on a substrate

TOSHIBA KK18 citations93
US6030729AFeb 29, 2000

Light exposure mask

TOSHIBA KK22 citations93
US5547787AAug 20, 1996

Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask

TOSHIBA KK29 citations93
US7293769B2Nov 13, 2007

Sheets separation/conveying apparatus

TOSHIBA KK23 citations92
US7009148B2Mar 7, 2006

Method of processing a substrate, heating apparatus, and method of forming a pattern

TOSHIBA KK16 citations92
US6881058B2Apr 19, 2005

Apparatus for processing substrate and method of processing the same

TOSHIBA KK14 citations92
US6742944B2Jun 1, 2004

Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method

TOSHIBA KK13 citations92
US6730447B2May 4, 2004

Manufacturing system in electronic devices

TOSHIBA KK20 citations92
US6709699B2Mar 23, 2004

Film-forming method, film-forming apparatus and liquid film drying apparatus

TOSHIBA KK27 citations92
US6506453B2Jan 14, 2003

Deposition method, deposition apparatus, and pressure-reduction drying apparatus

TOSHIBA KK25 citations92
US6441351B2Aug 27, 2002

Heating device, method for evaluating heating device and pattern forming method

TOSHIBA KK17 citations92
US6372413B2Apr 16, 2002

Method for cleaning the surface of substrate to which residues of resist stick

TOSHIBA KK35 citations92

SMC CORP

10 patents

YAMAHA CORP

5 patents

TOKYO ELECTRON LTD

3 patents

TOSHIBA TEC KK

1 patent

HITACHI LTD

1 patent

TOYOTA MOTOR CO LTD

1 patent

SONY CORP

1 patent

TEIJIN PHARMA LTD

1 patent

SANYO MACHINE WORKS

1 patent

STANLEY ELECTRIC CO LTD

1 patent

Showing the top 50 of 314 patents by PatentIndex Score.