Inventor
HEYNS MARC
BE22 patents
⚠️ This page may combine multiple inventors who share the name “HEYNS MARC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IMEC INTER UNI MICRO ELECTR
12 patentsUS6398975B1Jun 4, 2002
Method and apparatus for localized liquid treatment of the surface of a substrate
IMEC INTER UNI MICRO ELECTR169 citations99
US6334902B1Jan 1, 2002
Method and apparatus for removing a liquid from a surface
IMEC INTER UNI MICRO ELECTR93 citations98
US6491764B2Dec 10, 2002
Method and apparatus for removing a liquid from a surface of a rotating substrate
IMEC INTER UNI MICRO ELECTR196 citations97
US6851435B2Feb 8, 2005
Method and apparatus for localized liquid treatment of the surface of a substrate
IMEC INTER UNI MICRO ELECTR66 citations96
US6568408B2May 27, 2003
Method and apparatus for removing a liquid from a surface of a rotating substrate
IMEC INTER UNI MICRO ELECTR43 citations95
US6551409B1Apr 22, 2003
Method for removing organic contaminants from a semiconductor surface
IMEC INTER UNI MICRO ELECTR72 citations92
US6530385B2Mar 11, 2003
Apparatus and method for wet cleaning or etching a flat substrate
IMEC INTER UNI MICRO ELECTR18 citations92
US6261377B1Jul 17, 2001
Method of removing particles and a liquid from a surface of substrate
IMEC INTER UNI MICRO ELECTR21 citations91
US6821349B2Nov 23, 2004
Method and apparatus for removing a liquid from a surface
IMEC INTER UNI MICRO ELECTR13 citations84
US6247481B1Jun 19, 2001
Apparatus and method for wet cleaning or etching a flat substrate
IMEC INTER UNI MICRO ELECTR8 citations74
US6676765B2Jan 13, 2004
Method of removing particles and a liquid from a surface of substrate
IMEC INTER UNI MICRO ELECTR6 citations72
US7527698B2May 5, 2009
Method and apparatus for removing a liquid from a surface of a substrate
IMEC INTER UNI MICRO ELECTR7 citations69
IMEC VZW
6 patentsUS6387827B1May 14, 2002
Method for growing thin silicon oxides on a silicon substrate using chlorine precursors
IMEC VZW348 citations95
US6472294B2Oct 29, 2002
Semiconductor processing method for processing discrete pieces of substrate to form electronic devices
IMEC VZW32 citations92
US6322598B1Nov 27, 2001
Semiconductor processing system for processing discrete pieces of substrate to form electronic devices
IMEC VZW41 citations92
US5922624AJul 13, 1999
Method for semiconductor processing using mixtures of HF and carboxylic acid
IMEC VZW46 citations89
US6303522B1Oct 16, 2001
Oxidation in an ambient comprising ozone and the reaction products of an organic chloro-carbon precursor
IMEC VZW15 citations84
US9293536B2Mar 22, 2016
Bilayer graphene tunneling field effect transistor
IMEC VZW6 citations68