Inventor

NARAYANAN SUNDAR

US35 patents

⚠️ This page may combine multiple inventors who share the name “NARAYANAN SUNDAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NARAYANAN SUNDAR

CROSSBAR INC

Monolithic memory comprising 1T1R code memory and 1TnR storage class memory

Resistive random access memory (RRAM) cell and method for forming the RRAM cell

Monolithically integrated resistive memory using integrated-circuit foundry compatible processes

Method for surface roughness reduction after silicon germanium thin film deposition

Integrative resistive memory in backend metal layers

Regulating interface layer formation for two-terminal memory

Regulating interface layer growth with N2O for two-terminal memory

Liner layer for dielectric block layer

Flatness of memory cell surfaces

Scalable silicon based resistive memory device

Mitigating damage from a chemical mechanical planarization process

Using aluminum as etch stop layer

Memory stack liner comprising dielectric block layer material

Resistive random access memory and fabrication techniques

Using aluminum as etch stop layer

Monolithically integrated resistive memory using integrated-circuit foundry compatible processes

Resistive switching memory having confined filament formation and methods thereof

Resistive switching memory devices and method(s) for forming the resistive switching memory devices

Recessed high voltage metal oxide semiconductor transistor for RRAM cell

Low temperature in-situ doped silicon-based conductor material for memory cell

CYPRESS SEMICONDUCTOR CORP

Selective oxidation of gate stack

Deuterium incorporated nitride

Furnace system and method for selectively oxidizing a sidewall surface of a gate conductor by oxidizing a silicon sidewall in lieu of a refractory metal sidewall

Method for and structure formed from fabricating a relatively deep isolation structure

Removing whisker defects

Oxide-nitride stack gate dielectric

Method for growing ultra thin nitrided oxide

Nitride spacer formation

Method of making uniform oxide layer

Method and structure for determining a concentration profile of an impurity within a semiconductor layer

Formation of a shallow trench isolation structure in integrated circuits

Method of forming a narrow gate, and product produced thereby

Method of forming nitrided oxide in a hot wall single wafer furnace

Method and structure for determining a concentration profile of an impurity within a semiconductor layer

RAMKUMAR KRISHNASWAMY

Oxide-nitride stack gate dielectric