Inventor
NIE BUNSEN
US14 patents
Patents
14 patentsUS7790633B1Sep 7, 2010
Sequential deposition/anneal film densification method
NOVELLUS SYSTEMS INC643 citations98
US7482247B1Jan 27, 2009
Conformal nanolaminate dielectric deposition and etch bag gap fill process
NOVELLUS SYSTEMS INC583 citations98
US7148155B1Dec 12, 2006
Sequential deposition/anneal film densification method
NOVELLUS SYSTEMS INC416 citations98
US6340628B1Jan 22, 2002
Method to deposit SiOCH films with dielectric constant below 3.0
NOVELLUS SYSTEMS INC166 citations98
US7297608B1Nov 20, 2007
Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition
NOVELLUS SYSTEMS INC68 citations97
US6576345B1Jun 10, 2003
Dielectric films with low dielectric constants
NOVELLUS SYSTEMS INC110 citations97
US6867152B1Mar 15, 2005
Properties of a silica thin film produced by a rapid vapor deposition (RVD) process
NOVELLUS SYSTEMS INC83 citations96
US7294583B1Nov 13, 2007
Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films
NOVELLUS SYSTEMS INC18 citations92
US7202185B1Apr 10, 2007
Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer
NOVELLUS SYSTEMS INC48 citations92
US7129189B1Oct 31, 2006
Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)
NOVELLUS SYSTEMS INC26 citations92
US7097878B1Aug 29, 2006
Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films
NOVELLUS SYSTEMS INC35 citations92
US7223707B1May 29, 2007
Dynamic rapid vapor deposition process for conformal silica laminates
NOVELLUS SYSTEMS INC10 citations84
US7700155B1Apr 20, 2010
Method and apparatus for modulation of precursor exposure during a pulsed deposition process
NOVELLUS SYSTEMS INC2 citations60
US7678709B1Mar 16, 2010
Method of forming low-temperature conformal dielectric films
NOVELLUS SYSTEMS INC3 citations60