Inventor
IKUHARA SHOJI
JP36 patents
⚠️ This page may combine multiple inventors who share the name “IKUHARA SHOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
22 patentsUS6616759B2Sep 9, 2003
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD58 citations95
US7376479B2May 20, 2008
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD15 citations93
US7158848B2Jan 2, 2007
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD19 citations93
US7058467B2Jun 6, 2006
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD16 citations93
US7058470B2Jun 6, 2006
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD11 citations93
US6879867B2Apr 12, 2005
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD25 citations93
US6745096B2Jun 1, 2004
Maintenance method and system for plasma processing apparatus etching and apparatus
HITACHI LTD18 citations93
US6706543B2Mar 16, 2004
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor
HITACHI LTD13 citations93
US6733618B2May 11, 2004
Disturbance-free, recipe-controlled plasma processing system and method
HITACHI LTD18 citations92
US6069096AMay 30, 2000
Operating method of vacuum processing system and vacuum processing system
HITACHI LTD40 citations92
US4936967AJun 26, 1990
Method of detecting an end point of plasma treatment
HITACHI LTD30 citations92
US7601240B2Oct 13, 2009
Disturbance-free, recipe-controlled plasma processing system and method
HITACHI LTD9 citations84
US6881352B2Apr 19, 2005
Disturbance-free, recipe-controlled plasma processing method
HITACHI LTD12 citations84
US6596551B1Jul 22, 2003
Etching end point judging method, etching end point judging device, and insulating film etching method using these methods
HITACHI LTD17 citations84
US7343217B2Mar 11, 2008
System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation
HITACHI LTD4 citations74
US6828165B2Dec 7, 2004
Semiconductor plasma processing apparatus with first and second processing state monitoring units
HITACHI LTD10 citations74
US6776872B2Aug 17, 2004
Data processing apparatus for semiconductor processing apparatus
HITACHI LTD7 citations74
US6941185B2Sep 6, 2005
Operating method of vacuum processing system and vacuum processing system
HITACHI LTD11 citations73
US6853872B2Feb 8, 2005
Operating method of vacuum processing system and vacuum processing system
HITACHI LTD10 citations73
US6714832B1Mar 30, 2004
Operating method of vacuum processing system and vacuum processing system
HITACHI LTD12 citations73
US7062347B2Jun 13, 2006
Maintenance method and system for plasma processing apparatus
HITACHI LTD3 citations63
US6885906B2Apr 26, 2005
Operating method of vacuum processing system and vacuum processing system
HITACHI LTD2 citations62
HITACHI HIGH TECH CORP
10 patentsUS7107115B2Sep 12, 2006
Method for controlling semiconductor processing apparatus
HITACHI HIGH TECH CORP17 citations93
US7010374B2Mar 7, 2006
Method for controlling semiconductor processing apparatus
HITACHI HIGH TECH CORP15 citations84
US8038896B2Oct 18, 2011
Plasma processing method and apparatus
HITACHI HIGH TECH CORP12 citations83
US6939435B1Sep 6, 2005
Plasma processing apparatus and processing method
HITACHI HIGH TECH CORP7 citations74
US6908529B2Jun 21, 2005
Plasma processing apparatus and method
HITACHI HIGH TECH CORP8 citations74
US7330346B2Feb 12, 2008
Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus
HITACHI HIGH TECH CORP6 citations63
US6939433B2Sep 6, 2005
Sample processing apparatus and sample processing system
HITACHI HIGH TECH CORP2 citations63
US6841032B2Jan 11, 2005
Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber
HITACHI HIGH TECH CORP2 citations63
US10262840B2Apr 16, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US9230782B2Jan 5, 2016
Plasma processing method and apparatus
HITACHI HIGH TECH CORP1 citations51