Inventor
LOW RUSSELL J
US33 patents
⚠️ This page may combine multiple inventors who share the name “LOW RUSSELL J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VARIAN SEMICONDUCTOR EQUIPMENT
20 patentsUS7446326B2Nov 4, 2008
Technique for improving ion implanter productivity
VARIAN SEMICONDUCTOR EQUIPMENT29 citations92
US8937004B2Jan 20, 2015
Apparatus and method for controllably implanting workpieces
VARIAN SEMICONDUCTOR EQUIPMENT5 citations84
US7675046B2Mar 9, 2010
Terminal structure of an ion implanter
VARIAN SEMICONDUCTOR EQUIPMENT8 citations83
US7491947B2Feb 17, 2009
Technique for improving performance and extending lifetime of indirectly heated cathode ion source
VARIAN SEMICONDUCTOR EQUIPMENT11 citations83
US7102139B2Sep 5, 2006
Source arc chamber for ion implanter having repeller electrode mounted to external insulator
VARIAN SEMICONDUCTOR EQUIPMENT14 citations83
US8000080B2Aug 16, 2011
Particle trap
VARIAN SEMICONDUCTOR EQUIPMENT8 citations82
US7459704B2Dec 2, 2008
Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms
VARIAN SEMICONDUCTOR EQUIPMENT17 citations82
US7005657B1Feb 28, 2006
Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery
VARIAN SEMICONDUCTOR EQUIPMENT16 citations82
US7820986B2Oct 26, 2010
Techniques for controlling a charged particle beam
VARIAN SEMICONDUCTOR EQUIPMENT2 citations62
US7863520B2Jan 4, 2011
Interfacing two insulation parts in high voltage environment
VARIAN SEMICONDUCTOR EQUIPMENT2 citations60
US7482598B2Jan 27, 2009
Techniques for preventing parasitic beamlets from affecting ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT3 citations60
US7476877B2Jan 13, 2009
Wafer charge monitoring
VARIAN SEMICONDUCTOR EQUIPMENT2 citations60
US6984831B2Jan 10, 2006
Gas flow restricting cathode system for ion implanter and related method
VARIAN SEMICONDUCTOR EQUIPMENT2 citations60
US7361913B2Apr 22, 2008
Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control
VARIAN SEMICONDUCTOR EQUIPMENT4 citations53
US7528391B2May 5, 2009
Techniques for reducing contamination during ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT0 citations52
US7999239B2Aug 16, 2011
Techniques for reducing an electrical stress in an acceleration/deceleraion system
VARIAN SEMICONDUCTOR EQUIPMENT0 citations51
US7799999B2Sep 21, 2010
Insulated conducting device with multiple insulation segments
VARIAN SEMICONDUCTOR EQUIPMENT0 citations50
US7476878B2Jan 13, 2009
Techniques for reducing effects of photoresist outgassing
VARIAN SEMICONDUCTOR EQUIPMENT0 citations50
US7821213B2Oct 26, 2010
Techniques for controlling a charged particle beam
VARIAN SEMICONDUCTOR EQUIPMENT0 citations49
US7863531B2Jan 4, 2011
Techniques for making high voltage connections
VARIAN SEMICONDUCTOR EQUIPMENT0 citations48
LOW RUSSELL J
6 patentsUS8330127B2Dec 11, 2012
Flexible ion source
LOW RUSSELL J8 citations83
US8153466B2Apr 10, 2012
Mask applied to a workpiece
LOW RUSSELL J2 citations62
US8685846B2Apr 1, 2014
Technique for processing a substrate
LOW RUSSELL J0 citations51
US8598547B2Dec 3, 2013
Handling beam glitches during ion implantation of workpieces
LOW RUSSELL J0 citations51
US8756021B2Jun 17, 2014
Method and system for in-situ monitoring of cathode erosion and predicting cathode lifetime
LOW RUSSELL J1 citations47
US8455760B2Jun 4, 2013
Interfacing two insulation parts in high voltage environment
LOW RUSSELL J0 citations47