Inventor
HERMANSON ERIC D
US21 patents
⚠️ This page may combine multiple inventors who share the name “HERMANSON ERIC D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
10 patentsUS9978554B1May 22, 2018
Dual cathode ion source
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC9 citations82
US10504682B2Dec 10, 2019
Conductive beam optic containing internal heating element
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations73
US10446372B2Oct 15, 2019
Dual cathode ion source
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations71
US11114277B2Sep 7, 2021
Dual cathode ion source
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations61
US11049691B2Jun 29, 2021
Ion beam quality control using a movable mass resolving device
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations61
US11222768B2Jan 11, 2022
Foam in ion implantation system
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations56
US10741361B2Aug 11, 2020
Dual cathode ion source
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations50
US9484183B2Nov 1, 2016
Linkage conduit for vacuum chamber applications
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations49
US10643823B2May 5, 2020
Foam in ion implantation system
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations46
US10119529B2Nov 6, 2018
Cryopump arrangement for improved pump speed
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations37
APPLIED MATERIALS INC
6 patentsUS11437215B2Sep 6, 2022
Electrostatic filter providing reduced particle generation
APPLIED MATERIALS INC0 citations62
US11011343B2May 18, 2021
High-current ion implanter and method for controlling ion beam using high-current ion implanter
APPLIED MATERIALS INC0 citations62
US10886098B2Jan 5, 2021
Electrostatic filter and ion implanter having asymmetric electrostatic configuration
APPLIED MATERIALS INC0 citations60
US11562885B2Jan 24, 2023
Particle yield via beam-line pressure control
APPLIED MATERIALS INC0 citations59
US11810754B2Nov 7, 2023
System using pixelated faraday sensor
APPLIED MATERIALS INC0 citations56
US12165852B2Dec 10, 2024
Cover ring to mitigate carbon contamination in plasma doping chamber
APPLIED MATERIALS INC0 citations50
VARIAN SEMICONDUCTOR EQUIPMENT
3 patentsUS6791097B2Sep 14, 2004
Adjustable conductance limiting aperture for ion implanters
VARIAN SEMICONDUCTOR EQUIPMENT19 citations92
US7482598B2Jan 27, 2009
Techniques for preventing parasitic beamlets from affecting ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT3 citations60
US7476878B2Jan 13, 2009
Techniques for reducing effects of photoresist outgassing
VARIAN SEMICONDUCTOR EQUIPMENT0 citations50