Inventor

WU AIPING

US22 patents

⚠️ This page may combine multiple inventors who share the name “WU AIPING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU AIPING

AIR PROD & CHEM

Wet clean compositions for CoWP and porous dielectrics

Aqueous cleaning composition and method for using same

Cleaning composition for semiconductor substrates

pH buffered aqueous cleaning composition and method for removing photoresist residue

Water-rich stripping and cleaning formulation and method for using same

Aqueous based residue removers comprising fluoride

Cleaning formulations

Aqueous based residue removers comprising fluoride

Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation

VERSUM MAT US LLC

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

Composition comprising three alkanolamines and a hydroxylamine for removing etch residues

Post etch residue cleaning compositions and methods of using the same

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

Photoresist remover

Etching compositions and methods for using same

Selective plasma enhanced atomic layer deposition

WU AIPING

Aqueous cleaning composition for removing residues and method using same

Composition and method for photoresist removal

Cleaning formulations and method of using the cleaning formulations

GUAN ERYONG

Multi-level voltage converter

RAO MADHUKAR BHASKARA

Water-rich stripping and cleaning formulation and method for using same

WEIGEL SCOTT JEFFREY

Process for restoring dielectric properties