Inventor
SUNDARARAJAN RADHA
US29 patents
⚠️ This page may combine multiple inventors who share the name “SUNDARARAJAN RADHA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS7477960B2Jan 13, 2009
Fault detection and classification (FDC) using a run-to-run controller
TOKYO ELECTRON LTD86 citations95
US7967995B2Jun 28, 2011
Multi-layer/multi-input/multi-output (MLMIMO) models and method for using
TOKYO ELECTRON LTD25 citations92
US7894927B2Feb 22, 2011
Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for metal-gate structures
TOKYO ELECTRON LTD23 citations92
US7324193B2Jan 29, 2008
Measuring a damaged structure formed on a wafer using optical metrology
TOKYO ELECTRON LTD30 citations92
US9396900B2Jul 19, 2016
Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties
TOKYO ELECTRON LTD10 citations84
US8343371B2Jan 1, 2013
Apparatus and method for improving photoresist properties using a quasi-neutral beam
TOKYO ELECTRON LTD10 citations84
US8019458B2Sep 13, 2011
Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structures
TOKYO ELECTRON LTD14 citations84
US7988813B2Aug 2, 2011
Dynamic control of process chemistry for improved within-substrate process uniformity
TOKYO ELECTRON LTD9 citations84
US7899637B2Mar 1, 2011
Method and apparatus for creating a gate optimization evaluation library
TOKYO ELECTRON LTD11 citations84
US7939450B2May 10, 2011
Method and apparatus for spacer-optimization (S-O)
TOKYO ELECTRON LTD13 citations83
US7619731B2Nov 17, 2009
Measuring a damaged structure formed on a wafer using optical metrology
TOKYO ELECTRON LTD11 citations83
US7567700B2Jul 28, 2009
Dynamic metrology sampling with wafer uniformity control
TOKYO ELECTRON LTD11 citations82
US7502709B2Mar 10, 2009
Dynamic metrology sampling for a dual damascene process
TOKYO ELECTRON LTD17 citations82
US9431218B2Aug 30, 2016
Scalable and uniformity controllable diffusion plasma source
TOKYO ELECTRON LTD5 citations73
US7623978B2Nov 24, 2009
Damage assessment of a wafer using optical metrology
TOKYO ELECTRON LTD7 citations73
US7674636B2Mar 9, 2010
Dynamic temperature backside gas control for improved within-substrate process uniformity
TOKYO ELECTRON LTD5 citations63
US10354841B2Jul 16, 2019
Plasma generation and control using a DC ring
TOKYO ELECTRON LTD1 citations62
US7576851B2Aug 18, 2009
Creating a library for measuring a damaged structure formed on a wafer using optical metrology
TOKYO ELECTRON LTD5 citations62
US10375812B2Aug 6, 2019
Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) processing method and apparatus
TOKYO ELECTRON LTD0 citations52
US9301383B2Mar 29, 2016
Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus
TOKYO ELECTRON LTD0 citations52
FUNK MERRITT
3 patentsUS8816281B2Aug 26, 2014
Ion energy analyzer and methods of manufacturing the same
FUNK MERRITT16 citations92
US9087677B2Jul 21, 2015
Methods of electrical signaling in an ion energy analyzer
FUNK MERRITT8 citations83
US8183062B2May 22, 2012
Creating metal gate structures using Lithography-Etch-Lithography-Etch (LELE) processing sequences
FUNK MERRITT3 citations61
CHEN ZHIYING
2 patentsUS8486798B1Jul 16, 2013
Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof
CHEN ZHIYING6 citations83
US8721833B2May 13, 2014
Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof
CHEN ZHIYING4 citations72