Inventor
SHIMURA SATORU
JP21 patents
⚠️ This page may combine multiple inventors who share the name “SHIMURA SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS9741559B2Aug 22, 2017
Film forming method, computer storage medium, and film forming system
TOKYO ELECTRON LTD466 citations98
US9329483B2May 3, 2016
Film forming method, non-transitory computer storage medium and film forming apparatus
TOKYO ELECTRON LTD7 citations83
US6485203B2Nov 26, 2002
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD17 citations83
US10998183B2May 4, 2021
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
TOKYO ELECTRON LTD2 citations73
US10964606B2Mar 30, 2021
Film forming system, film forming method, and computer storage medium
TOKYO ELECTRON LTD4 citations73
US7401988B2Jul 22, 2008
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD7 citations73
US7208066B2Apr 24, 2007
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD7 citations73
US8791030B2Jul 29, 2014
Coating treatment method and coating treatment apparatus
TOKYO ELECTRON LTD4 citations72
US10025190B2Jul 17, 2018
Substrate treatment system
TOKYO ELECTRON LTD2 citations71
US9341952B2May 17, 2016
Substrate treatment method, non-transitory computer storage medium and substrate treatment system
TOKYO ELECTRON LTD2 citations62
US9280052B2Mar 8, 2016
Substrate treatment method, non-transitory computer storage medium and substrate treatment system
TOKYO ELECTRON LTD2 citations62
US8037890B2Oct 18, 2011
Substrate cleaning device and substrate cleaning method
TOKYO ELECTRON LTD5 citations62
US7781342B2Aug 24, 2010
Substrate treatment method for etching a base film using a resist pattern
TOKYO ELECTRON LTD0 citations51
US7485568B2Feb 3, 2009
Method for forming wiring of semiconductor device
TOKYO ELECTRON LTD0 citations51
US12197129B2Jan 14, 2025
Substrate treatment method and substrate treatment system
TOKYO ELECTRON LTD0 citations50
US10101669B2Oct 16, 2018
Exposure apparatus, resist pattern forming method, and storage medium
TOKYO ELECTRON LTD0 citations40
YAEGASHI HIDETAMI
2 patentsUS8283253B2Oct 9, 2012
Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus
YAEGASHI HIDETAMI4 citations61
US8273661B2Sep 25, 2012
Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus
YAEGASHI HIDETAMI3 citations61