Inventor
KOSHIYAMA JUN
JP25 patents
⚠️ This page may combine multiple inventors who share the name “KOSHIYAMA JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
16 patentsUS6015467AJan 18, 2000
Method of removing coating from edge of substrate
TOKYO OHKA KOGYO CO LTD49 citations91
US6117623ASep 12, 2000
Remover solvent for partial removal of photoresist layer
TOKYO OHKA KOGYO CO LTD21 citations88
US7795197B2Sep 14, 2010
Cleaning liquid for lithography and method for resist pattern formation
TOKYO OHKA KOGYO CO LTD10 citations83
US7741260B2Jun 22, 2010
Rinsing fluid for lithography
TOKYO OHKA KOGYO CO LTD12 citations83
US5518860AMay 21, 1996
Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound
TOKYO OHKA KOGYO CO LTD13 citations74
US8367312B2Feb 5, 2013
Detergent for lithography and method of forming resist pattern with the same
TOKYO OHKA KOGYO CO LTD5 citations72
US7897325B2Mar 1, 2011
Lithographic rinse solution and method for forming patterned resist layer using the same
TOKYO OHKA KOGYO CO LTD2 citations62
US7811748B2Oct 12, 2010
Resist pattern forming method and composite rinse agent
TOKYO OHKA KOGYO CO LTD2 citations62
US6734258B2May 11, 2004
Protective coating composition for dual damascene process
TOKYO OHKA KOGYO CO LTD5 citations62
US7884062B2Feb 8, 2011
Cleaning liquid for lithography and cleaning method using same
TOKYO OHKA KOGYO CO LTD4 citations61
US7179399B2Feb 20, 2007
Material for forming protective film
TOKYO OHKA KOGYO CO LTD0 citations52
US9291905B2Mar 22, 2016
Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
TOKYO OHKA KOGYO CO LTD0 citations50
US6835530B2Dec 28, 2004
Base material for lithography
TOKYO OHKA KOGYO CO LTD1 citations50
US10576433B2Mar 3, 2020
Method for purifying liquid, method for producing chemical solution or cleaning solution, filter medium, and filter device
TOKYO OHKA KOGYO CO LTD0 citations46
US7576046B2Aug 18, 2009
Cleaning liquid for lithography and method of cleaning therewith
TOKYO OHKA KOGYO CO LTD0 citations42
US10576432B2Mar 3, 2020
Polyimide and/or polyamideimide porous body and method for manufacturing same, method for separation and/or adsorption, separation material, adsorption material, filter media, laminate, and filter device
TOKYO OHKA KOGYO CO LTD0 citations38
KOSHIYAMA JUN
3 patentsUS9244358B2Jan 26, 2016
Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate
KOSHIYAMA JUN9 citations82
US8409360B2Apr 2, 2013
Cleaning method for a process of liquid immersion lithography
KOSHIYAMA JUN2 citations60
US8058220B2Nov 15, 2011
Cleaning liquid for lithography and a cleaning method using it for photoexposure devices
KOSHIYAMA JUN2 citations60
YOSHIDA MASAAKI
2 patentsSAWANO ATSUSHI
2 patentsUS8158328B2Apr 17, 2012
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same
SAWANO ATSUSHI2 citations57
US8455182B2Jun 4, 2013
Composition for antireflection film formation and method for resist pattern formation using the composition
SAWANO ATSUSHI0 citations36