Inventor

WAKIYA KAZUMASA

JP43 patents

⚠️ This page may combine multiple inventors who share the name “WAKIYA KAZUMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WAKIYA KAZUMASA

TOKYO OHKA KOGYO CO LTD

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Remover solution composition for resist and method for removing resist using the same

Process for treating a lithographic substrate and a rinse solution for the treatment

Photoresist stripping solution and a method of stripping photoresists with the same

Post-ashing treating liquid compositions and a process for treatment therewith

Substrate treatment method

Remover solution composition for resist and method for removing resist using the same

Developer solution for photolithographic patterning

Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film

Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition

Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition

Remover solution for resist

Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Post-ashing treating method for substrates

Photoresist stripping liquid composition and a method of stripping photoresists using the same

Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film

Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern

Cleaning liquid for lithography and method for resist pattern formation

Rinsing fluid for lithography

Cleaning composition and method of cleaning semiconductor substrate

Coating solution for forming antireflective coating film

Detergent for lithography and method of forming resist pattern with the same

Method for forming a finely patterned photoresist layer

Composition for lithographic anti-reflection coating, and resist laminate using the same

Cleaning composition, cleaning method, and method for manufacturing semiconductor

Lithographic rinse solution and method for forming patterned resist layer using the same

Resist pattern forming method and composite rinse agent

Protective coating composition for dual damascene process

Undercoating material for wiring, embedded material, and wiring formation method

Material for forming protective film

Method for processing coating film and method for manufacturing semiconductor element with use of the same method

Method for processing substrate, chemical solution, and method for providing chemical solution

Method for stripping photoresist

Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern

YOKOI SHIGERU

Photoresist stripping solution and a method of stripping photoresists using the same

Cleaning liquid used in photolithography and a method for treating substrate therewith

Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith

TOKYO OHIKA KOGYO CO LTD

Rinsing solution for lithography and method for processing substrate with the use of the same

KOSHIYAMA JUN

Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate

ISHIKAWA KIYOSHI

Method for forming pattern, and material for forming coating film

WAKIYA KAZUMASA

Photoresist stripping solution and a method of stripping photoresists using the same