Inventor
KIM YOUNG-PIL
KR76 patents
⚠️ This page may combine multiple inventors who share the name “KIM YOUNG-PIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
21 patentsUS7323710B2Jan 29, 2008
Fin field effect transistors having multi-layer fin patterns
SAMSUNG ELECTRONICS CO LTD84 citations98
US6897109B2May 24, 2005
Methods of manufacturing integrated circuit devices having contact holes using multiple insulating layers
SAMSUNG ELECTRONICS CO LTD92 citations98
US5422295AJun 6, 1995
Method for forming a semiconductor memory device having a vertical multi-layered storage electrode
SAMSUNG ELECTRONICS CO LTD100 citations96
US9153692B2Oct 6, 2015
Semiconductor device having a stress film on a side surface of a fin
SAMSUNG ELECTRONICS CO LTD40 citations93
US6043537AMar 28, 2000
Embedded memory logic device using self-aligned silicide and manufacturing method therefor
SAMSUNG ELECTRONICS CO LTD23 citations90
US5981324ANov 9, 1999
Methods of forming integrated circuits having memory cell arrays and peripheral circuits therein
SAMSUNG ELECTRONICS CO LTD32 citations90
US5631185AMay 20, 1997
Method for manufacturing capacitor of semiconductor memory device
SAMSUNG ELECTRONICS CO LTD20 citations90
US5714401AFeb 3, 1998
Semiconductor device capacitor manufactured by forming stack with multiple material layers without conductive layer therebetween
SAMSUNG ELECTRONICS CO LTD18 citations84
US7009257B2Mar 7, 2006
Methods of manufacturing integrated circuit devices having reduced contact resistance between a substrate and a contact pad while maintaining separation of the substrate and the contact pad and integrated circuit devices formed thereby
SAMSUNG ELECTRONICS CO LTD5 citations74
US6818551B2Nov 16, 2004
Methods of forming contact holes using multiple insulating layers
SAMSUNG ELECTRONICS CO LTD8 citations74
US6689654B2Feb 10, 2004
Methods of manufacturing integrated circuit devices having reduced contact resistance between a substrate and a contact pad while maintaining separation of the substrate and the contact pad
SAMSUNG ELECTRONICS CO LTD6 citations74
US6576963B2Jun 10, 2003
Semiconductor device having transistor
SAMSUNG ELECTRONICS CO LTD9 citations74
US5766970AJun 16, 1998
Method of manufacturing a twin well semiconductor device with improved planarity
SAMSUNG ELECTRONICS CO LTD7 citations74
US6858529B2Feb 22, 2005
Methods of forming contact plugs including polysilicon doped with an impurity having a lesser diffusion coefficient than phosphorus
SAMSUNG ELECTRONICS CO LTD9 citations72
US7315063B2Jan 1, 2008
CMOS transistor and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD7 citations71
US6214676B1Apr 10, 2001
Embedded memory logic device using self-aligned silicide and manufacturing method therefor
SAMSUNG ELECTRONICS CO LTD13 citations71
US8050074B2Nov 1, 2011
Magnetic packet memory storage devices, memory systems including such devices, and methods of controlling such devices
SAMSUNG ELECTRONICS CO LTD4 citations63
US7864619B2Jan 4, 2011
Write driver circuit for phase-change memory, memory including the same, and associated methods
SAMSUNG ELECTRONICS CO LTD4 citations63
US7557388B2Jul 7, 2009
MOSFET formed on a strained silicon layer
SAMSUNG ELECTRONICS CO LTD2 citations63
US7271408B2Sep 18, 2007
Semiconductor device test patterns and related methods for precisely measuring leakage currents in semiconductor cell transistors
SAMSUNG ELECTRONICS CO LTD5 citations63
US7176533B2Feb 13, 2007
Semiconductor devices having contact plugs including polysilicon doped with an impurity having a lesser diffusion coefficient than phosphorus
SAMSUNG ELECTRONICS CO LTD2 citations61
SEAGATE TECHNOLOGY LLC
10 patentsUS9940232B1Apr 10, 2018
Post-program conditioning of stacked memory cells prior to an initial read operation
SEAGATE TECHNOLOGY LLC8 citations84
US7935619B2May 3, 2011
Polarity dependent switch for resistive sense memory
SEAGATE TECHNOLOGY LLC9 citations84
US9122626B2Sep 1, 2015
Linearly related threshold voltage offsets
SEAGATE TECHNOLOGY LLC10 citations83
US9589655B1Mar 7, 2017
Fast soft data by detecting leakage current and sensing time
SEAGATE TECHNOLOGY LLC7 citations81
US9330790B2May 3, 2016
Temperature tracking to manage threshold voltages in a memory
SEAGATE TECHNOLOGY LLC12 citations78
US7825478B2Nov 2, 2010
Polarity dependent switch for resistive sense memory
SEAGATE TECHNOLOGY LLC5 citations74
US9069474B2Jun 30, 2015
Retention based defecting in a hybrid memory system
SEAGATE TECHNOLOGY LLC5 citations72
US9576624B2Feb 21, 2017
Multi-dimentional data randomization
SEAGATE TECHNOLOGY LLC2 citations69
US8854772B1Oct 7, 2014
Adhesion enhancement of thin film PZT structure
SEAGATE TECHNOLOGY LLC3 citations63
US7800941B2Sep 21, 2010
Magnetic memory with magnetic tunnel junction cell sets
SEAGATE TECHNOLOGY LLC5 citations63
KIM YOUNG PIL
4 patentsUS8617952B2Dec 31, 2013
Vertical transistor with hardening implatation
KIM YOUNG PIL15 citations83
US8288749B2Oct 16, 2012
Schottky diode switch and memory units containing the same
KIM YOUNG PIL2 citations62
US8198181B1Jun 12, 2012
Schottky diode switch and memory units containing the same
KIM YOUNG PIL4 citations62
US8158964B2Apr 17, 2012
Schottky diode switch and memory units containing the same
KIM YOUNG PIL4 citations62
SOITEC SILICON ON INSULATOR
4 patentsUS12009209B2Jun 11, 2024
Process for preparing a support for a semiconductor structure
SOITEC SILICON ON INSULATOR1 citations73
US12374546B2Jul 29, 2025
Supports for semiconductor structures
SOITEC SILICON ON INSULATOR0 citations63
US11508578B2Nov 22, 2022
Process for preparing a support for a semiconductor structure
SOITEC SILICON ON INSULATOR0 citations63
US12581922B2Mar 17, 2026
Method for forming a high resistivity handle support for composite substrate
SOITEC SILICON ON INSULATOR0 citations60
MICRON TECHNOLOGY INC
2 patentsUS7902028B2Mar 8, 2011
Methods of forming field effect transistors, methods of forming field effect transistor gates, methods of forming integrated circuitry comprising a transistor gate array and circuitry peripheral to the gate array, and methods of forming integrated circuitry comprising a transistor gate array including first gates and second grounded isolation gates
MICRON TECHNOLOGY INC16 citations93
US7700441B2Apr 20, 2010
Methods of forming field effect transistors, methods of forming field effect transistor gates, methods of forming integrated circuitry comprising a transistor gate array and circuitry peripheral to the gate array, and methods of forming integrated circuitry comprising a transistor gate array including first gates and second grounded isolation gates
MICRON TECHNOLOGY INC21 citations93
JUNG CHULMIN
2 patentsKOREA RES INST CHEM TECH
1 patentDONGBU ELECTRONICS CO LTD
1 patentKOREA ADVANCED INST SCI & TECH
1 patentSANDISK TECHNOLOGIES LLC
1 patentSUN MING
1 patentKIM HO-JUNG
1 patentKIM YOUNG-PIL
1 patentShowing the top 50 of 76 patents by PatentIndex Score.