Inventor
YAMAZOE KENJI
US49 patents
⚠️ This page may combine multiple inventors who share the name “YAMAZOE KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
24 patentsUS7009686B2Mar 7, 2006
Exposure method
CANON KK60 citations96
US7217503B2May 15, 2007
Exposure method and apparatus
CANON KK41 citations93
US7107573B2Sep 12, 2006
Method for setting mask pattern and illumination condition
CANON KK48 citations93
US7508493B2Mar 24, 2009
Exposure apparatus and device manufacturing method
CANON KK30 citations92
US7675629B2Mar 9, 2010
Exposure apparatus and device manufacturing method using a common path interferometer to form an interference pattern and a processor to calculate optical characteristics of projection optics using the interference pattern
CANON KK14 citations84
US7657865B2Feb 2, 2010
Computer-readable recording medium recording a mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method
CANON KK9 citations84
US7359033B2Apr 15, 2008
Exposure method and apparatus
CANON KK10 citations84
US7214453B2May 8, 2007
Mask and its manufacturing method, exposure, and device fabrication method
CANON KK16 citations84
US7573563B2Aug 11, 2009
Exposure apparatus and device manufacturing method
CANON KK7 citations74
US6839890B2Jan 4, 2005
Mask manufacturing method
CANON KK9 citations74
US9507253B2Nov 29, 2016
Mask pattern generating method, recording medium, and information processing apparatus
CANON KK4 citations73
US9228921B2Jan 5, 2016
Aberration estimating method, program, and image-pickup apparatus
CANON KK3 citations73
US10073936B2Sep 11, 2018
Calculation method, generation method, program, exposure method, and mask fabrication method
CANON KK1 citations63
US8635563B2Jan 21, 2014
Mask data producing method and mask data producing program
CANON KK2 citations63
US8365104B2Jan 29, 2013
Original data producing method and original data producing program
CANON KK2 citations63
US7761840B2Jul 20, 2010
Mask data generation including a main pattern and an auxiliary pattern
CANON KK4 citations63
US7586626B2Sep 8, 2009
Measurement method, exposure method, exposure apparatus, and device fabrication method
CANON KK2 citations63
US7399558B2Jul 15, 2008
Mask and manufacturing method thereof and exposure method
CANON KK3 citations63
US7317511B2Jan 8, 2008
Light modulator, and optical apparatus using the same
CANON KK2 citations63
US7379151B2May 27, 2008
Exposure apparatus comprising cleaning apparatus for cleaning mask with laser beam
CANON KK3 citations62
US7821648B2Oct 26, 2010
Measurement method, a measurement apparatus, and a computer-readable recording medium
CANON KK3 citations61
US7414240B2Aug 19, 2008
Particle remover, exposure apparatus having the same, and device manufacturing method
CANON KK0 citations52
US6968529B2Nov 22, 2005
Phase shift mask, and exposure method and device manufacturing method using the same
CANON KK0 citations52
US9678441B2Jun 13, 2017
Mask pattern generation method and optical image calculation method
CANON KK0 citations41
TAIWAN SEMICONDUCTOR MFG CO LTD
10 patentsUS11709435B2Jul 25, 2023
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11320747B2May 3, 2022
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10990002B2Apr 27, 2021
Sub-resolution assist features
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11754930B2Sep 12, 2023
Multi-component kernels for vector optical image simulation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11435670B1Sep 6, 2022
Multi-component kernels for vector optical image simulation
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US12416857B2Sep 16, 2025
Sub-resolution assist features
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12235589B2Feb 25, 2025
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12153349B2Nov 26, 2024
Multi-component kernels for vector optical image simulation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11829066B2Nov 28, 2023
Sub-resolution assist features
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10866525B2Dec 15, 2020
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
CANON USA INC
6 patentsUS10288868B2May 14, 2019
Optical probe, light intensity detection, imaging method and system
CANON USA INC6 citations72
US10530976B2Jan 7, 2020
Endoscope probes and systems, and methods for use therewith
CANON USA INC4 citations71
US10966597B2Apr 6, 2021
Forward and angle view endoscope
CANON USA INC4 citations70
US10444146B2Oct 15, 2019
Optical probe, light intensity detection, imaging method and system
CANON USA INC1 citations63
US10194065B2Jan 29, 2019
Endoscope probes and systems, and methods for use therewith
CANON USA INC1 citations59
US9869820B2Jan 16, 2018
Optical probe, light intensity detection, imaging method and system
CANON USA INC1 citations52
YAMAZOE KENJI
5 patentsUS8059262B2Nov 15, 2011
Calculation program, and exposure method for calculating light intensity distribution formed on image plane
YAMAZOE KENJI11 citations83
US8843337B2Sep 23, 2014
Apparatus for measuring shape of test surface, and recording medium storing program for calculating shape of test surface
YAMAZOE KENJI2 citations62
US8239787B2Aug 7, 2012
Method of generating original plate data by repeatedly calculating approximate aerial image
YAMAZOE KENJI2 citations62
US8321815B2Nov 27, 2012
Recording medium storing original data generation program, original data generation method, original fabricating method, exposure method, and device manufacturing method
YAMAZOE KENJI3 citations61
US8908153B2Dec 9, 2014
Method to calculate transmission cross coefficient in an exposure apparatus
YAMAZOE KENJI0 citations51