Inventor
DUSA MIRCEA
BE31 patents
⚠️ This page may combine multiple inventors who share the name “DUSA MIRCEA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
23 patentsUS7791727B2Sep 7, 2010
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV89 citations99
US7791732B2Sep 7, 2010
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV80 citations98
US7791724B2Sep 7, 2010
Characterization of transmission losses in an optical system
ASML NETHERLANDS BV59 citations96
US7112813B2Sep 26, 2006
Device inspection method and apparatus using an asymmetric marker
ASML NETHERLANDS BV61 citations96
US7916284B2Mar 29, 2011
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
ASML NETHERLANDS BV23 citations93
US8760662B2Jun 24, 2014
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV16 citations92
US8054467B2Nov 8, 2011
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV15 citations92
US7564555B2Jul 21, 2009
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV21 citations92
US7148959B2Dec 12, 2006
Test pattern, inspection method, and device manufacturing method
ASML NETHERLANDS BV16 citations84
US10241055B2Mar 26, 2019
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV3 citations83
US7480050B2Jan 20, 2009
Lithographic system, sensor, and method of measuring properties of a substrate
ASML NETHERLANDS BV13 citations83
US7466413B2Dec 16, 2008
Marker structure, mask pattern, alignment method and lithographic method and apparatus
ASML NETHERLANDS BV11 citations78
US7315384B2Jan 1, 2008
Inspection apparatus and method of inspection
ASML NETHERLANDS BV8 citations74
US7151594B2Dec 19, 2006
Test pattern, inspection method, and device manufacturing method
ASML NETHERLANDS BV6 citations74
US10955353B2Mar 23, 2021
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV2 citations73
US7532307B2May 12, 2009
Focus determination method, device manufacturing method, and mask
ASML NETHERLANDS BV6 citations63
US7312860B2Dec 25, 2007
Test pattern, inspection method, and device manufacturing method
ASML NETHERLANDS BV4 citations63
US11525786B2Dec 13, 2022
Method and apparatus for angular-resolved spectroscopic lithography characterization
ASML NETHERLANDS BV0 citations62
US7704850B2Apr 27, 2010
Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations60
US8945800B2Feb 3, 2015
Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program
ASML NETHERLANDS BV3 citations58
US9368366B2Jun 14, 2016
Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
ASML NETHERLANDS BV1 citations51
US7786477B2Aug 31, 2010
Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations49
US10656536B2May 19, 2020
Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations37