P

Inventor

VAN HAREN RICHARD JOHANNES FRANCISCUS

NL83 patents
⚠️ This page may combine multiple inventors who share the name “VAN HAREN RICHARD JOHANNES FRANCISCUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

45 patents
US7486408B2Feb 3, 2009

Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement

ASML NETHERLANDS BV53 citations98
US7880880B2Feb 1, 2011

Alignment systems and methods for lithographic systems

ASML NETHERLANDS BV24 citations95
US10274834B2Apr 30, 2019

Methods and apparatus for obtaining diagnostic information relating to an industrial process

ASML NETHERLANDS BV15 citations93
US9946165B2Apr 17, 2018

Methods and apparatus for obtaining diagnostic information relating to an industrial process

ASML NETHERLANDS BV19 citations93
US7460231B2Dec 2, 2008

Alignment tool for a lithographic apparatus

ASML NETHERLANDS BV9 citations84
US11204239B2Dec 21, 2021

Metrology method, target and substrate

ASML NETHERLANDS BV7 citations83
US10718604B2Jul 21, 2020

Metrology method, target and substrate

ASML NETHERLANDS BV6 citations83
US10642162B2May 5, 2020

Methods and apparatus for obtaining diagnostic information relating to an industrial process

ASML NETHERLANDS BV8 citations83
US10386176B2Aug 20, 2019

Metrology method, target and substrate

ASML NETHERLANDS BV5 citations83
US9291916B2Mar 22, 2016

Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods

ASML NETHERLANDS BV5 citations83
US7897058B2Mar 1, 2011

Device manufacturing method and computer program product

ASML NETHERLANDS BV10 citations83
US7863763B2Jan 4, 2011

Binary sinusoidal sub-wavelength gratings as alignment marks

ASML NETHERLANDS BV17 citations83
US7629697B2Dec 8, 2009

Marker structure and method for controlling alignment of layers of a multi-layered substrate

ASML NETHERLANDS BV10 citations83
US7466413B2Dec 16, 2008

Marker structure, mask pattern, alignment method and lithographic method and apparatus

ASML NETHERLANDS BV11 citations78
US10061212B2Aug 28, 2018

Metrology target, method and apparatus, target design method, computer program and lithographic system

ASML NETHERLANDS BV4 citations73
US11940740B2Mar 26, 2024

Methods and apparatus for obtaining diagnostic information relating to an industrial process

ASML NETHERLANDS BV2 citations72
US11428521B2Aug 30, 2022

Metrology method, target and substrate

ASML NETHERLANDS BV3 citations72
US11187995B2Nov 30, 2021

Metrology using a plurality of metrology target measurement recipes

ASML NETHERLANDS BV2 citations72
US11054813B2Jul 6, 2021

Method and apparatus for controlling an industrial process using product grouping

ASML NETHERLANDS BV2 citations72
US10331043B2Jun 25, 2019

Optimization of target arrangement and associated target

ASML NETHERLANDS BV6 citations72
US10162272B2Dec 25, 2018

Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method

ASML NETHERLANDS BV2 citations72
US10025193B2Jul 17, 2018

Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product

ASML NETHERLANDS BV3 citations72
US7619738B2Nov 17, 2009

Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus

ASML NETHERLANDS BV4 citations72
US10474045B2Nov 12, 2019

Lithographic apparatus and device manufacturing method

ASML NETHERLANDS BV6 citations71
US7439531B2Oct 21, 2008

Alignment systems and methods for lithographic systems

ASML NETHERLANDS BV7 citations71
US11099486B2Aug 24, 2021

Generating predicted data for control or monitoring of a production process

ASML NETHERLANDS BV3 citations70
US9879988B2Jan 30, 2018

Metrology method and apparatus, computer program and lithographic system

ASML NETHERLANDS BV4 citations70
US11300889B2Apr 12, 2022

Metrology apparatus

ASML NETHERLANDS BV3 citations69
US9753377B2Sep 5, 2017

Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus

ASML NETHERLANDS BV2 citations69
US10324379B2Jun 18, 2019

Lithographic apparatus and method

ASML NETHERLANDS BV3 citations67
US11294294B2Apr 5, 2022

Alignment mark positioning in a lithographic process

ASML NETHERLANDS BV2 citations66
US11226567B2Jan 18, 2022

Methods and apparatus for use in a device manufacturing method

ASML NETHERLANDS BV2 citations66
US7989303B2Aug 2, 2011

Method of creating an alignment mark on a substrate and substrate

ASML NETHERLANDS BV2 citations63
US7916276B2Mar 29, 2011

Lithographic apparatus and device manufacturing method with double exposure overlay control

ASML NETHERLANDS BV2 citations63
US7821650B2Oct 26, 2010

Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement

ASML NETHERLANDS BV3 citations63
US7687209B2Mar 30, 2010

Lithographic apparatus and device manufacturing method with double exposure overlay control

ASML NETHERLANDS BV3 citations63
US7573574B2Aug 11, 2009

Lithographic apparatus and device manufacturing method

ASML NETHERLANDS BV3 citations63
US7550379B2Jun 23, 2009

Alignment mark, use of a hard mask material, and method

ASML NETHERLANDS BV2 citations63
US12429328B2Sep 30, 2025

Metrology method, target and substrate

ASML NETHERLANDS BV0 citations62
US12287584B2Apr 29, 2025

Methods and apparatus for obtaining diagnostic information relating to an industrial process

ASML NETHERLANDS BV0 citations62
US11493851B2Nov 8, 2022

Lithographic method and lithographic apparatus

ASML NETHERLANDS BV0 citations62
US11385550B2Jul 12, 2022

Methods and apparatus for obtaining diagnostic information relating to an industrial process

ASML NETHERLANDS BV0 citations62
US11156923B2Oct 26, 2021

Lithographic method and lithographic apparatus

ASML NETHERLANDS BV1 citations62
US11126093B2Sep 21, 2021

Focus and overlay improvement by modifying a patterning device

ASML NETHERLANDS BV0 citations62
US11036146B2Jun 15, 2021

Method and apparatus to reduce effects of nonlinear behavior

ASML NETHERLANDS BV0 citations62

VAN DER SANDEN STEFAN CORNELIS THEODORUS

1 patent

VAN BILSEN FRANCISCUS BERNARDUS MARIA

1 patent

VAN HAREN RICHARD JOHANNES FRANCISCUS

1 patent

MUSA SAMI

1 patent

ASML NETHERLANDS N V

1 patent

Showing the top 50 of 83 patents by PatentIndex Score.