Inventor
VAN HAREN RICHARD JOHANNES FRANCISCUS
NL83 patents
⚠️ This page may combine multiple inventors who share the name “VAN HAREN RICHARD JOHANNES FRANCISCUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
45 patentsUS7486408B2Feb 3, 2009
Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement
ASML NETHERLANDS BV53 citations98
US7880880B2Feb 1, 2011
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV24 citations95
US10274834B2Apr 30, 2019
Methods and apparatus for obtaining diagnostic information relating to an industrial process
ASML NETHERLANDS BV15 citations93
US9946165B2Apr 17, 2018
Methods and apparatus for obtaining diagnostic information relating to an industrial process
ASML NETHERLANDS BV19 citations93
US7460231B2Dec 2, 2008
Alignment tool for a lithographic apparatus
ASML NETHERLANDS BV9 citations84
US11204239B2Dec 21, 2021
Metrology method, target and substrate
ASML NETHERLANDS BV7 citations83
US10718604B2Jul 21, 2020
Metrology method, target and substrate
ASML NETHERLANDS BV6 citations83
US10642162B2May 5, 2020
Methods and apparatus for obtaining diagnostic information relating to an industrial process
ASML NETHERLANDS BV8 citations83
US10386176B2Aug 20, 2019
Metrology method, target and substrate
ASML NETHERLANDS BV5 citations83
US9291916B2Mar 22, 2016
Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods
ASML NETHERLANDS BV5 citations83
US7897058B2Mar 1, 2011
Device manufacturing method and computer program product
ASML NETHERLANDS BV10 citations83
US7863763B2Jan 4, 2011
Binary sinusoidal sub-wavelength gratings as alignment marks
ASML NETHERLANDS BV17 citations83
US7629697B2Dec 8, 2009
Marker structure and method for controlling alignment of layers of a multi-layered substrate
ASML NETHERLANDS BV10 citations83
US7466413B2Dec 16, 2008
Marker structure, mask pattern, alignment method and lithographic method and apparatus
ASML NETHERLANDS BV11 citations78
US10061212B2Aug 28, 2018
Metrology target, method and apparatus, target design method, computer program and lithographic system
ASML NETHERLANDS BV4 citations73
US11940740B2Mar 26, 2024
Methods and apparatus for obtaining diagnostic information relating to an industrial process
ASML NETHERLANDS BV2 citations72
US11428521B2Aug 30, 2022
Metrology method, target and substrate
ASML NETHERLANDS BV3 citations72
US11187995B2Nov 30, 2021
Metrology using a plurality of metrology target measurement recipes
ASML NETHERLANDS BV2 citations72
US11054813B2Jul 6, 2021
Method and apparatus for controlling an industrial process using product grouping
ASML NETHERLANDS BV2 citations72
US10331043B2Jun 25, 2019
Optimization of target arrangement and associated target
ASML NETHERLANDS BV6 citations72
US10162272B2Dec 25, 2018
Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US10025193B2Jul 17, 2018
Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
ASML NETHERLANDS BV3 citations72
US7619738B2Nov 17, 2009
Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus
ASML NETHERLANDS BV4 citations72
US10474045B2Nov 12, 2019
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV6 citations71
US7439531B2Oct 21, 2008
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV7 citations71
US11099486B2Aug 24, 2021
Generating predicted data for control or monitoring of a production process
ASML NETHERLANDS BV3 citations70
US9879988B2Jan 30, 2018
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV4 citations70
US11300889B2Apr 12, 2022
Metrology apparatus
ASML NETHERLANDS BV3 citations69
US9753377B2Sep 5, 2017
Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus
ASML NETHERLANDS BV2 citations69
US10324379B2Jun 18, 2019
Lithographic apparatus and method
ASML NETHERLANDS BV3 citations67
US11294294B2Apr 5, 2022
Alignment mark positioning in a lithographic process
ASML NETHERLANDS BV2 citations66
US11226567B2Jan 18, 2022
Methods and apparatus for use in a device manufacturing method
ASML NETHERLANDS BV2 citations66
US7989303B2Aug 2, 2011
Method of creating an alignment mark on a substrate and substrate
ASML NETHERLANDS BV2 citations63
US7916276B2Mar 29, 2011
Lithographic apparatus and device manufacturing method with double exposure overlay control
ASML NETHERLANDS BV2 citations63
US7821650B2Oct 26, 2010
Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement
ASML NETHERLANDS BV3 citations63
US7687209B2Mar 30, 2010
Lithographic apparatus and device manufacturing method with double exposure overlay control
ASML NETHERLANDS BV3 citations63
US7573574B2Aug 11, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations63
US7550379B2Jun 23, 2009
Alignment mark, use of a hard mask material, and method
ASML NETHERLANDS BV2 citations63
US12429328B2Sep 30, 2025
Metrology method, target and substrate
ASML NETHERLANDS BV0 citations62
US12287584B2Apr 29, 2025
Methods and apparatus for obtaining diagnostic information relating to an industrial process
ASML NETHERLANDS BV0 citations62
US11493851B2Nov 8, 2022
Lithographic method and lithographic apparatus
ASML NETHERLANDS BV0 citations62
US11385550B2Jul 12, 2022
Methods and apparatus for obtaining diagnostic information relating to an industrial process
ASML NETHERLANDS BV0 citations62
US11156923B2Oct 26, 2021
Lithographic method and lithographic apparatus
ASML NETHERLANDS BV1 citations62
US11126093B2Sep 21, 2021
Focus and overlay improvement by modifying a patterning device
ASML NETHERLANDS BV0 citations62
US11036146B2Jun 15, 2021
Method and apparatus to reduce effects of nonlinear behavior
ASML NETHERLANDS BV0 citations62
VAN DER SANDEN STEFAN CORNELIS THEODORUS
1 patentVAN BILSEN FRANCISCUS BERNARDUS MARIA
1 patentVAN HAREN RICHARD JOHANNES FRANCISCUS
1 patentMUSA SAMI
1 patentASML NETHERLANDS N V
1 patentShowing the top 50 of 83 patents by PatentIndex Score.