Inventor

SEWELL HARRY

US65 patents

⚠️ This page may combine multiple inventors who share the name “SEWELL HARRY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEWELL HARRY

ASML HOLDING NV

Immersion photolithography system and method using inverted wafer-projection optics interface

Method and system for dual reticle image exposure

Immersion photolithography system and method using inverted wafer-projection optics interface

Lithographic printing with polarized light

System and method for patterning both sides of a substrate utilizing imprint lithography

Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Lithographic printing with polarized light

Patterned grid element polarizer

Use of multiple reticles in lithographic printing tools

Interferometric lithography system and method used to generate equal path lengths of interfering beams

Method for making a computer hard drive platen using a nano-plate

Method and apparatus for imprint pattern replication

System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby

System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby

Maskless optical writer

Use of multiple reticles in lithographic printing tools

Adjustable resolution interferometric lithography system

Adjustable resolution interferometric lithography system

Liquid immersion lithography system with tilted liquid flow

Tunable wavelength illumination system

Enhancing the image contrast of a high resolution exposure tool

System and method for patterning both sides of a substrate utilizing imprint lithography

Method and system for making a nano-plate for imprint lithography

Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Catadioptric lithography system and method with reticle stage orthogonal to wafer stage

Catadioptric lithography system and method with reticle stage orthogonal to wafer stage

Interferometric lithographic projection apparatus

Immersion photolithography system and method using inverted wafer-projection optics interface

SEWELL HARRY

Scanning EUV interference imaging for extremely high resolution patterning

Systems and methods for insitu lens cleaning using ozone in immersion lithography

Immersion lithographic apparatus with immersion fluid re-circulating system

Lithographic apparatus and device manufacturing method

Lithographic method and apparatus

EUV mask inspection system

Method and system for increasing alignment target contrast

System and method to increase surface tension and contact angle in immersion lithography

Lithographic apparatus and device manufacturing method

ASML NETHERLANDS BV

Device manufacturing method and computer program product

Lithographic apparatus, a dryer and a method of removing liquid from a surface

Lithographic apparatus, a dryer and a method of removing liquid from a surface

Liquid immersion lithography system having a tilted showerhead relative to a substrate

Lithographic apparatus with a fluid combining unit and related device manufacturing method

(unassigned)

Use of multiple reticles in lithographic printing tools

DEN BOEF ARIE JEFFREY

Tunable wavelength illumination system

LEENDERS MARTINUS HENDRIKUS ANTONIUS

Lithographic apparatus, a dryer and a method of removing liquid from a surface

PERKIN ELMER CORP

Apparatus and method for reproducing a pattern in an annular area

PHILIPS CORP

Pyroelectric detector comprising nucleating material wettable by aqueous solution of pyroelectric material

NELSON MICHAEL L

Mask inspection with fourier filtering and image compare

ASML HOLDING B V

Lithographic apparatus and device manufacturing method