Inventor
KONG BYUNGKOOK
US10 patents
Patents
10 patentsUS10347500B1Jul 9, 2019
Device fabrication via pulsed plasma
APPLIED MATERIALS INC19 citations92
US9299580B2Mar 29, 2016
High aspect ratio plasma etch for 3D NAND semiconductor applications
APPLIED MATERIALS INC17 citations83
US10580657B2Mar 3, 2020
Device fabrication via pulsed plasma
APPLIED MATERIALS INC9 citations82
US9287124B2Mar 15, 2016
Method of etching a boron doped carbon hardmask
APPLIED MATERIALS INC8 citations77
US10727075B2Jul 28, 2020
Uniform EUV photoresist patterning utilizing pulsed plasma process
APPLIED MATERIALS INC3 citations71
US9390923B2Jul 12, 2016
Methods of removing residual polymers formed during a boron-doped amorphous carbon layer etch process
APPLIED MATERIALS INC3 citations68
US9064812B2Jun 23, 2015
Aspect ratio dependent etch (ARDE) lag reduction process by selective oxidation with inert gas sputtering
APPLIED MATERIALS INC6 citations68
US10847368B2Nov 24, 2020
EUV resist patterning using pulsed plasma
APPLIED MATERIALS INC1 citations55
US9418867B2Aug 16, 2016
Mask passivation using plasma
APPLIED MATERIALS INC2 citations55
US9627216B2Apr 18, 2017
Method for forming features in a silicon containing layer
APPLIED MATERIALS INC0 citations37