Inventor
FAN YIN
US4 patents
Patents
4 patentsUS9515166B2Dec 6, 2016
Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
APPLIED MATERIALS INC14 citations83
US9385219B2Jul 5, 2016
Method and apparatus for selective deposition
APPLIED MATERIALS INC11 citations83
US9911594B2Mar 6, 2018
Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
APPLIED MATERIALS INC3 citations72
US9754791B2Sep 5, 2017
Selective deposition utilizing masks and directional plasma treatment
APPLIED MATERIALS INC5 citations72