Inventor
IM BADRO
KR5 patents
Patents
5 patentsUS9305928B2Apr 5, 2016
Semiconductor devices having a silicon-germanium channel layer and methods of forming the same
SAMSUNG ELECTRONICS CO LTD11 citations79
US10141200B2Nov 27, 2018
Methods of manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD12 citations76
US10224213B2Mar 5, 2019
Method for forming patterns of a semiconductor device
SAMSUNG ELECTRONICS CO LTD6 citations66
US10553449B2Feb 4, 2020
Methods of forming a silicon layer, methods of forming patterns, and methods of manufacturing semiconductor devices using the same
SAMSUNG ELECTRONICS CO LTD0 citations48
US9666433B2May 30, 2017
Methods for manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations47