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Inventor

KALUTARAGE LAKMAL C

US19 patents
⚠️ This page may combine multiple inventors who share the name “KALUTARAGE LAKMAL C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

16 patents
US11398388B2Jul 26, 2022

Methods for selective dry etching gallium oxide

APPLIED MATERIALS INC2 citations71
US11371136B2Jun 28, 2022

Methods for selective deposition of dielectric on silicon oxide

APPLIED MATERIALS INC2 citations70
US12131900B2Oct 29, 2024

Methods for depositing blocking layers on metal surfaces

APPLIED MATERIALS INC0 citations62
US11417515B2Aug 16, 2022

Methods for depositing blocking layers on metal surfaces

APPLIED MATERIALS INC0 citations62
US12281382B2Apr 22, 2025

Methods for depositing blocking layers on conductive surfaces

APPLIED MATERIALS INC0 citations60
US11942330B2Mar 26, 2024

Methods for selective dry etching gallium oxide

APPLIED MATERIALS INC0 citations60
US11702733B2Jul 18, 2023

Methods for depositing blocking layers on conductive surfaces

APPLIED MATERIALS INC0 citations60
US11393678B2Jul 19, 2022

Low-k dielectric films

APPLIED MATERIALS INC0 citations60
US11515149B2Nov 29, 2022

Deposition of flowable silicon-containing films

APPLIED MATERIALS INC1 citations59
US12500080B2Dec 16, 2025

Systems and methods for depositing low-K dielectric films

APPLIED MATERIALS INC0 citations58
US10354861B2Jul 16, 2019

Low temperature molecular layer deposition of SiCON

APPLIED MATERIALS INC0 citations52
US12031209B2Jul 9, 2024

Reducing agents for atomic layer deposition

APPLIED MATERIALS INC0 citations51
US12018363B2Jun 25, 2024

Gap-fill with aluminum-containing films

APPLIED MATERIALS INC0 citations51
US11289328B2Mar 29, 2022

Deposition and etch processes of chromium-containing thin films for semiconductor manufacturing

APPLIED MATERIALS INC0 citations51
US10760159B2Sep 1, 2020

Methods and apparatus for depositing yttrium-containing films

APPLIED MATERIALS INC0 citations51
US11107674B2Aug 31, 2021

Methods for depositing silicon nitride

APPLIED MATERIALS INC0 citations50

UNIV WAYNE STATE

3 patents