P

Inventor

WANG CHUNYAO

TW36 patents
⚠️ This page may combine multiple inventors who share the name “WANG CHUNYAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

33 patents
US10134604B1Nov 20, 2018

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11437245B2Sep 6, 2022

Germanium hump reduction

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations81
US10483168B2Nov 19, 2019

Low-k gate spacer and formation thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11652158B2May 16, 2023

Field-effect transistor device with gate spacer structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11393674B2Jul 19, 2022

Forming low-stress silicon nitride layer through hydrogen treatment

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11380776B2Jul 5, 2022

Field-effect transistor device with gate spacer structure

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11929254B2Mar 12, 2024

Semiconductor patterning and resulting structures

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11521856B2Dec 6, 2022

Semiconductor patterning and resulting structures

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations71
US12444602B2Oct 14, 2025

Semiconductor device structure and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12419097B2Sep 16, 2025

Semiconductor device structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12342605B2Jun 24, 2025

Semiconductor device with fin structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12266728B2Apr 1, 2025

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12261036B2Mar 25, 2025

Forming low-stress silicon nitride layer through hydrogen treatment

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12176349B2Dec 24, 2024

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12148813B2Nov 19, 2024

Field-effect transistor device with gate spacer structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12002719B2Jun 4, 2024

Gapfill structure and manufacturing methods thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11942549B2Mar 26, 2024

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11935746B2Mar 19, 2024

Pattern formation through mask stress management and resulting structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11830727B2Nov 28, 2023

Forming low-stress silicon nitride layer through hydrogen treatment

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11764221B2Sep 19, 2023

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11688645B2Jun 27, 2023

Structure and formation method of semiconductor device with fin structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11557518B2Jan 17, 2023

Gapfill structure and manufacturing methods thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11527653B2Dec 13, 2022

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12125911B2Oct 22, 2024

Method of modulating stress of dielectric layers

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11502196B2Nov 15, 2022

Stress modulation for dielectric layers

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12437996B2Oct 7, 2025

Semiconductor patterning and resulting structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11854819B2Dec 26, 2023

Germanium hump reduction

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10867807B2Dec 15, 2020

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10854521B2Dec 1, 2020

Low-k gate spacer and formation thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10510612B2Dec 17, 2019

Low-K gate spacer and formation thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12266541B2Apr 1, 2025

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11955370B2Apr 9, 2024

Semiconductor devices and methods of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10720526B2Jul 21, 2020

Stress modulation for dielectric layers

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51

YINDU KITCHEN EQUIPMENT CO LTD

2 patents

UNIV TSINGHUA

1 patent