Inventor
JEONG HWAN J
US33 patents
⚠️ This page may combine multiple inventors who share the name “JEONG HWAN J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ULTRATECH STEPPER INC
11 patentsUS6531681B1Mar 11, 2003
Apparatus having line source of radiant energy for exposing a substrate
ULTRATECH STEPPER INC241 citations99
US6142641ANov 7, 2000
Four-mirror extreme ultraviolet (EUV) lithography projection system
ULTRATECH STEPPER INC131 citations96
US5852693ADec 22, 1998
Low-loss light redirection apparatus
ULTRATECH STEPPER INC63 citations96
US5822066AOct 13, 1998
Point diffraction interferometer and pin mirror for use therewith
ULTRATECH STEPPER INC68 citations96
US5621813AApr 15, 1997
Pattern recognition alignment system
ULTRATECH STEPPER INC68 citations95
US6381077B1Apr 30, 2002
Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate
ULTRATECH STEPPER INC44 citations93
US5557469ASep 17, 1996
Beamsplitter in single fold optical system and optical variable magnification method and system
ULTRATECH STEPPER INC36 citations93
US5303001AApr 12, 1994
Illumination system for half-field dyson stepper
ULTRATECH STEPPER INC31 citations93
US5402205AMar 28, 1995
Alignment system for a Half-Field Dyson projection system
ULTRATECH STEPPER INC17 citations72
US5329332AJul 12, 1994
System for achieving a parallel relationship between surfaces of wafer and reticle of half-field dyson stepper
ULTRATECH STEPPER INC8 citations72
US5266790ANov 30, 1993
Focusing technique suitable for use with an unpatterned specular substrate
ULTRATECH STEPPER INC19 citations72
APPLIED MATERIALS INC
9 patentsUS10133193B2Nov 20, 2018
Piecewise alignment modeling method
APPLIED MATERIALS INC6 citations84
US10983441B2Apr 20, 2021
Resolution enhanced digital lithography with anti-blazed DMD
APPLIED MATERIALS INC2 citations73
US10495983B2Dec 3, 2019
Piecewise alignment modeling method
APPLIED MATERIALS INC2 citations73
US12372779B2Jul 29, 2025
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
APPLIED MATERIALS INC0 citations62
US11899198B2Feb 13, 2024
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
APPLIED MATERIALS INC1 citations62
US10429744B2Oct 1, 2019
Image improvement for alignment through incoherent illumination blending
APPLIED MATERIALS INC0 citations52
US10372042B2Aug 6, 2019
Resolution enhanced digital lithography with anti-blazed DMD
APPLIED MATERIALS INC0 citations52
US11243480B2Feb 8, 2022
System for making accurate grating patterns using multiple writing columns each making multiple scans
APPLIED MATERIALS INC0 citations51
US10451564B2Oct 22, 2019
Empirical detection of lens aberration for diffraction-limited optical system
APPLIED MATERIALS INC0 citations51