Inventor
KOMURO OSAMU
JP41 patents
⚠️ This page may combine multiple inventors who share the name “KOMURO OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
18 patentsUS6627888B2Sep 30, 2003
Scanning electron microscope
HITACHI LTD30 citations96
US7095884B2Aug 22, 2006
Method and apparatus for circuit pattern inspection
HITACHI LTD22 citations93
US6909930B2Jun 21, 2005
Method and system for monitoring a semiconductor device manufacturing process
HITACHI LTD52 citations93
US7369703B2May 6, 2008
Method and apparatus for circuit pattern inspection
HITACHI LTD10 citations84
US6573499B1Jun 3, 2003
Microstructured pattern inspection method
HITACHI LTD12 citations82
US7791021B2Sep 7, 2010
Microstructured pattern inspection method
HITACHI LTD6 citations74
US7435959B2Oct 14, 2008
Microstructured pattern inspection method
HITACHI LTD7 citations74
US7217923B2May 15, 2007
Microstructured pattern inspection method
HITACHI LTD7 citations74
US6936819B2Aug 30, 2005
Microstructured pattern inspection method
HITACHI LTD4 citations74
US6872943B2Mar 29, 2005
Method for determining depression/protrusion of sample and charged particle beam apparatus therefor
HITACHI LTD10 citations74
US6803573B2Oct 12, 2004
Scanning electron microscope
HITACHI LTD6 citations74
US6791096B2Sep 14, 2004
Process conditions change monitoring systems that use electron beams, and related monitoring methods
HITACHI LTD6 citations74
US6791082B2Sep 14, 2004
Process conditions change monitoring systems that use electron beams, and related monitoring methods
HITACHI LTD11 citations74
US6765204B2Jul 20, 2004
Microstructured pattern inspection method
HITACHI LTD7 citations74
US7439505B2Oct 21, 2008
Scanning electron microscope
HITACHI LTD2 citations63
US7166840B2Jan 23, 2007
Method for determining depression/protrusion of sample and charged particle beam apparatus therefor
HITACHI LTD3 citations63
US7002151B2Feb 21, 2006
Scanning electron microscope
HITACHI LTD2 citations63
US7214937B2May 8, 2007
Electron microscope
HITACHI LTD6 citations59
HITACHI HIGH TECH CORP
12 patentsUS7230723B2Jun 12, 2007
High-accuracy pattern shape evaluating method and apparatus
HITACHI HIGH TECH CORP20 citations93
US6913861B2Jul 5, 2005
Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
HITACHI HIGH TECH CORP24 citations92
US7619751B2Nov 17, 2009
High-accuracy pattern shape evaluating method and apparatus
HITACHI HIGH TECH CORP9 citations84
US7405835B2Jul 29, 2008
High-accuracy pattern shape evaluating method and apparatus
HITACHI HIGH TECH CORP5 citations74
US7180062B2Feb 20, 2007
Pattern measuring method
HITACHI HIGH TECH CORP5 citations74
US10545017B2Jan 28, 2020
Overlay error measuring device and computer program for causing computer to measure pattern
HITACHI HIGH TECH CORP2 citations73
US7851754B2Dec 14, 2010
Charged particle beam system
HITACHI HIGH TECH CORP3 citations63
US7288764B2Oct 30, 2007
Pattern measuring method
HITACHI HIGH TECH CORP2 citations63
US10840060B2Nov 17, 2020
Scanning electron microscope and sample observation method
HITACHI HIGH TECH CORP1 citations62
US11690208B2Jun 27, 2023
Electromagnetic field shielding plate, method for manufacturing same, electromagnetic field shielding structure, and semiconductor manufacturing environment
HITACHI HIGH TECH CORP0 citations52
US9443695B2Sep 13, 2016
Charged-particle beam device
HITACHI HIGH TECH CORP0 citations52
US7941008B2May 10, 2011
Pattern search method
HITACHI HIGH TECH CORP0 citations41