Inventor
MOROKUMA HIDETOSHI
JP73 patents
⚠️ This page may combine multiple inventors who share the name “MOROKUMA HIDETOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
31 patentsUS7164128B2Jan 16, 2007
Method and apparatus for observing a specimen
HITACHI HIGH TECH CORP26 citations93
USD748813SFeb 2, 2016
Sample preparation container
HITACHI HIGH TECH CORP44 citations92
US7923703B2Apr 12, 2011
Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus
HITACHI HIGH TECH CORP18 citations92
US7732792B2Jun 8, 2010
Pattern measurement apparatus
HITACHI HIGH TECH CORP23 citations92
US7679055B2Mar 16, 2010
Pattern displacement measuring method and pattern measuring device
HITACHI HIGH TECH CORP16 citations92
US7559047B2Jul 7, 2009
Method and apparatus for creating imaging recipe
HITACHI HIGH TECH CORP36 citations92
US7187345B2Mar 6, 2007
Image forming method and charged particle beam apparatus
HITACHI HIGH TECH CORP14 citations92
US6929892B2Aug 16, 2005
Method of monitoring an exposure process
HITACHI HIGH TECH CORP25 citations92
US6913861B2Jul 5, 2005
Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
HITACHI HIGH TECH CORP24 citations92
USD746476SDec 29, 2015
Component analyzer
HITACHI HIGH TECH CORP10 citations84
US8853630B2Oct 7, 2014
Scanning electron microscope and a method for imaging a specimen using the same
HITACHI HIGH TECH CORP5 citations84
US8019161B2Sep 13, 2011
Method, device and computer program of length measurement
HITACHI HIGH TECH CORP14 citations84
US7935927B2May 3, 2011
Method and apparatus for observing a specimen
HITACHI HIGH TECH CORP7 citations84
US7889908B2Feb 15, 2011
Method and apparatus for measuring shape of a specimen
HITACHI HIGH TECH CORP7 citations84
US7816062B2Oct 19, 2010
Method and apparatus for semiconductor device production process monitoring and method and apparatus for estimating cross sectional shape of a pattern
HITACHI HIGH TECH CORP17 citations84
US7705300B2Apr 27, 2010
Charged particle beam adjusting method and charged particle beam apparatus
HITACHI HIGH TECH CORP15 citations84
US7685560B2Mar 23, 2010
Method and apparatus for monitoring exposure process
HITACHI HIGH TECH CORP16 citations84
US7681159B2Mar 16, 2010
System and method for detecting defects in a semiconductor during manufacturing thereof
HITACHI HIGH TECH CORP15 citations84
US7518110B2Apr 14, 2009
Pattern measuring method and pattern measuring device
HITACHI HIGH TECH CORP13 citations84
US7365325B2Apr 29, 2008
Method and apparatus for observing a specimen
HITACHI HIGH TECH CORP11 citations84
US9006679B2Apr 14, 2015
Mass spectrometer
HITACHI HIGH TECH CORP6 citations83
US8368013B2Feb 5, 2013
Analyzer, ionization apparatus and analyzing method
HITACHI HIGH TECH CORP12 citations83
US7817105B2Oct 19, 2010
Image forming method and charged particle beam apparatus
HITACHI HIGH TECH CORP9 citations83
US7925095B2Apr 12, 2011
Pattern matching method and computer program for executing pattern matching
HITACHI HIGH TECH CORP6 citations74
US7230243B2Jun 12, 2007
Method and apparatus for measuring three-dimensional shape of specimen by using SEM
HITACHI HIGH TECH CORP9 citations74
US7173268B2Feb 6, 2007
Method of measuring pattern dimension and method of controlling semiconductor device process
HITACHI HIGH TECH CORP9 citations74
USD711011SAug 12, 2014
Sample holder for a component analyzer
HITACHI HIGH TECH CORP4 citations73
US8803084B2Aug 12, 2014
Mass spectrometer and mass spectrometry
HITACHI HIGH TECH CORP5 citations72
US8356260B2Jan 15, 2013
Method and apparatus for monitoring cross-sectional shape of a pattern formed on a semiconductor device
HITACHI HIGH TECH CORP4 citations63
US7889909B2Feb 15, 2011
Pattern matching method and pattern matching program
HITACHI HIGH TECH CORP6 citations63
US7459712B2Dec 2, 2008
Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unit
HITACHI HIGH TECH CORP2 citations63
HITACHI LTD
7 patentsUS6627888B2Sep 30, 2003
Scanning electron microscope
HITACHI LTD30 citations96
US6909930B2Jun 21, 2005
Method and system for monitoring a semiconductor device manufacturing process
HITACHI LTD52 citations93
US7365322B2Apr 29, 2008
Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern
HITACHI LTD28 citations92
US6713761B2Mar 30, 2004
Scanning electron microscope
HITACHI LTD24 citations90
US6803573B2Oct 12, 2004
Scanning electron microscope
HITACHI LTD6 citations74
US6791082B2Sep 14, 2004
Process conditions change monitoring systems that use electron beams, and related monitoring methods
HITACHI LTD11 citations74
US6791096B2Sep 14, 2004
Process conditions change monitoring systems that use electron beams, and related monitoring methods
HITACHI LTD6 citations74
HITACHI SCIENCE SYSTEMS LTD
2 patentsMOROKUMA HIDETOSHI
2 patentsKUMANO SHUN
2 patentsHASHIMOTO YUICHIRO
1 patentMATSUOKA RYOICHI
1 patentSUTANI TAKUMICHI
1 patentISHIGURO KOUJI
1 patentMIYAMOTO ATSUSHI
1 patentSUGIYAMA MASUYUKI
1 patentShowing the top 50 of 73 patents by PatentIndex Score.