P

Inventor

SUGIHARA KAZUYOSHI

JP38 patents
⚠️ This page may combine multiple inventors who share the name “SUGIHARA KAZUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

26 patents
US6992290B2Jan 31, 2006

Electron beam inspection system and inspection method and method of manufacturing devices using the system

TOSHIBA KK97 citations98
US6534766B2Mar 18, 2003

Charged particle beam system and pattern slant observing method

TOSHIBA KK93 citations98
US5429730AJul 4, 1995

Method of repairing defect of structure

TOSHIBA KK114 citations97
US6316163B1Nov 13, 2001

Pattern forming method

TOSHIBA KK57 citations96
US6028953AFeb 22, 2000

Mask defect repair system and method which controls a dose of a particle beam

TOSHIBA KK65 citations96
US5989759ANov 23, 1999

Pattern forming method using alignment from latent image or base pattern on substrate

TOSHIBA KK41 citations96
US5639699AJun 17, 1997

Focused ion beam deposition using TMCTS

TOSHIBA KK62 citations96
US5591970AJan 7, 1997

Charged beam apparatus

TOSHIBA KK56 citations96
US5539211AJul 23, 1996

Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus

TOSHIBA KK56 citations96
US7179569B2Feb 20, 2007

Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same

TOSHIBA KK24 citations93
US6770402B2Aug 3, 2004

Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same

TOSHIBA KK24 citations93
US6147355ANov 14, 2000

Pattern forming method

TOSHIBA KK22 citations93
US6991878B2Jan 31, 2006

Photomask repair method and apparatus

TOSHIBA KK23 citations92
US6495841B1Dec 17, 2002

Charged beam drawing apparatus

TOSHIBA KK30 citations92
US5994030ANov 30, 1999

Pattern-forming method and lithographic system

TOSHIBA KK23 citations92
US5799104AAug 25, 1998

Mask defect repair system and method

TOSHIBA KK38 citations92
US5523576AJun 4, 1996

Charged beam drawing apparatus

TOSHIBA KK21 citations87
US7745073B2Jun 29, 2010

Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same

TOSHIBA KK10 citations84
US7459246B2Dec 2, 2008

Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same

TOSHIBA KK9 citations84
US6633045B1Oct 14, 2003

Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part

TOSHIBA KK13 citations84
US4578607AMar 25, 1986

Piezoelectric precise rotation mechanism for slightly rotating an object

TOSHIBA KK20 citations82
US4469949ASep 4, 1984

Electron beam pattern transfer device and method for aligning mask and semiconductor wafer

TOSHIBA KK21 citations82
US6941008B2Sep 6, 2005

Pattern forming method

TOSHIBA KK7 citations74
US6093931AJul 25, 2000

Pattern-forming method and lithographic system

TOSHIBA KK11 citations73
US5949076ASep 7, 1999

Charged beam applying apparatus

TOSHIBA KK12 citations73
US5843603ADec 1, 1998

Method of evaluating shaped beam of charged beam writer and method of forming pattern

TOSHIBA KK14 citations73

TOKYO SHIBAURA ELECTRIC CO

4 patents

MITSUBISHI ELECTRIC CORP

4 patents

EBARA CORP

2 patents

TOSHIBA MACHINE CO LTD

1 patent

SUGIHARA KAZUYOSHI

1 patent