Inventor

OGI KATSUMI

JP30 patents

⚠️ This page may combine multiple inventors who share the name “OGI KATSUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OGI KATSUMI

MITSUBISHI MATERIALS CORP

Bi-based ferroelectric composition and thin film, method for forming the thin film, and non-volatile memory

Composition for formation of electrode pattern

Formation of thin-film patterns of a metal oxide

Method for forming a pattern of non-volatile ferroelectric thin film memory

High-purity TI complexes, methods for producing the same and BST film-forming liquid compositions

Method of controlling crystal orientation of PZT and PLZT thin films on platinum substrates

Composition for forming metal oxide thin film pattern and method for forming metal oxide thin film pattern

Ultrahigh-purity ferroelectric thin film

Organic copper compound, liquid mixture containing the compound, and copper thin-film prepared using the solution

Bi-based dielectric thin films, and compositions and method for forming them

Composition for forming metal oxide thin film pattern and method for forming metal oxide thin film pattern

Silica powder and method for producing the same

Silica powder and method for producing the same

Organic titanium compound suitable for MOCVD

Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film

Organozirconium compound, organic solution comprising same, and zirconium-containing thin film therefrom

Solution raw material for forming composite oxide type dielectric thin film and dielectric thin film

Organic titanium compound suitable for MOCVD

Ba and/or Sr titanate films by organic chemical vapor deposition

Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds

SYMETRIX CORP

Ferroelectric/high dielectric constant integrated circuit and method of fabricating same

Method of fabricating an integrated circuit using self-patterned thin films

Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films

Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same

Photosensitive liquid precursor solutions and use thereof in making thin films

Composition and process using ester solvents for fabricating metal oxide films and electronic devices including the same

MITSUBISHI METAL CORP

Apparatus for preparing high-melting-point high-toughness metals

Apparatus for preparing high melting point high toughness metals

Apparatus for preparing high-melting-point high-toughness metals

RAMTRON INT CORP

Ferroelectric thin films and solutions: compositions