Inventor
FINK STEVEN T
US35 patents
⚠️ This page may combine multiple inventors who share the name “FINK STEVEN T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
29 patentsUS7296534B2Nov 20, 2007
Hybrid ball-lock attachment apparatus
TOKYO ELECTRON LTD79 citations98
US7005842B2Feb 28, 2006
Probe cartridge assembly and multi-probe assembly
TOKYO ELECTRON LTD126 citations97
US6963043B2Nov 8, 2005
Asymmetrical focus ring
TOKYO ELECTRON LTD53 citations96
US7552521B2Jun 30, 2009
Method and apparatus for improved baffle plate
TOKYO ELECTRON LTD51 citations94
US7347901B2Mar 25, 2008
Thermally zoned substrate holder assembly
TOKYO ELECTRON LTD25 citations93
US7601242B2Oct 13, 2009
Plasma processing system and baffle assembly for use in plasma processing system
TOKYO ELECTRON LTD19 citations92
US7311784B2Dec 25, 2007
Plasma processing device
TOKYO ELECTRON LTD45 citations92
US7064812B2Jun 20, 2006
Method of using a sensor gas to determine erosion level of consumable system components
TOKYO ELECTRON LTD24 citations92
US6962348B2Nov 8, 2005
Sealing apparatus having a single groove
TOKYO ELECTRON LTD32 citations92
US6887341B2May 3, 2005
Plasma processing apparatus for spatial control of dissociation and ionization
TOKYO ELECTRON LTD25 citations92
US7001482B2Feb 21, 2006
Method and apparatus for improved focus ring
TOKYO ELECTRON LTD24 citations91
US7582186B2Sep 1, 2009
Method and apparatus for an improved focus ring in a plasma processing system
TOKYO ELECTRON LTD17 citations84
US7166170B2Jan 23, 2007
Cylinder-based plasma processing system
TOKYO ELECTRON LTD11 citations84
US7163603B2Jan 16, 2007
Plasma source assembly and method of manufacture
TOKYO ELECTRON LTD10 citations84
US7110110B2Sep 19, 2006
Sensing component used to monitor material buildup and material erosion of consumables by optical emission
TOKYO ELECTRON LTD13 citations84
US7461614B2Dec 9, 2008
Method and apparatus for improved baffle plate
TOKYO ELECTRON LTD16 citations83
US7241397B2Jul 10, 2007
Honeycomb optical window deposition shield and method for a plasma processing system
TOKYO ELECTRON LTD16 citations83
US7789963B2Sep 7, 2010
Chuck pedestal shield
TOKYO ELECTRON LTD7 citations74
US7227624B2Jun 5, 2007
Method and apparatus for monitoring the condition of plasma equipment
TOKYO ELECTRON LTD9 citations66
US7604701B2Oct 20, 2009
Method and apparatus for removing external components from a process chamber without compromising process vacuum
TOKYO ELECTRON LTD2 citations63
US7143887B2Dec 5, 2006
Multi-position stop mechanism
TOKYO ELECTRON LTD2 citations63
US6942222B2Sep 13, 2005
Seal for sealing and load bearing a process tube in a vacuum system
TOKYO ELECTRON LTD6 citations63
US7186313B2Mar 6, 2007
Plasma chamber wall segment temperature control
TOKYO ELECTRON LTD2 citations62
US6960887B2Nov 1, 2005
Method and apparatus for tuning a plasma reactor chamber
TOKYO ELECTRON LTD3 citations58
US7350476B2Apr 1, 2008
Method and apparatus to determine consumable part condition
TOKYO ELECTRON LTD1 citations52
US7237666B2Jul 3, 2007
Multi-position stop mechanism
TOKYO ELECTRON LTD0 citations52
US7235155B2Jun 26, 2007
Method and apparatus for monitoring plasma conditions using a monitoring ring
TOKYO ELECTRON LTD0 citations52
US7088046B2Aug 8, 2006
Integrated process tube and electrostatic shield, assembly thereof and manufacture thereof
TOKYO ELECTRON LTD0 citations52
US7040032B2May 9, 2006
Method and device for measuring whether a process kit part meets a prescribed tolerance
TOKYO ELECTRON LTD1 citations52