Inventor

HOSHINO WATARU

JP51 patents

⚠️ This page may combine multiple inventors who share the name “HOSHINO WATARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOSHINO WATARU

FUJIFILM CORP

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method

Liquid crystal display device

Polarizer, method of producing polarizer, laminate, and image display device

Liquid crystalline composition, polymer liquid crystal compound, light absorption anisotropic film, laminate, and image display device

Polarizer and image display device

Polarizer and image display device

Luminance-enhancing film, optical sheet member, and liquid crystal display device

Anisotropic light absorption film and laminate

Coloring composition, light absorption anisotropic film, laminate, and image display device

Light absorption anisotropic layer, optical film, viewing angle control system, and image display device

Light absorption anisotropic film, viewing angle control system, and image display device

Light absorption anisotropic film, viewing angle control system, and image display device

Polarizer and image display device

Optical film, viewing angle control system, and image display device

Polarizer, method of producing polarizer, laminate, and image display device

Polarizer and image display device

Liquid crystal composition, light absorption anisotropic film, laminate, and image display device

Laminate and image display device

Method for manufacturing optical laminate, optical laminate, and image display device

Optical film, brightness enhancement film, backlight unit with brightness enhancement film, and liquid crystal display device

Optical film, liquid crystal display device, and manufacturing method of optical film

Polarizer and image display device

Optical film, method for producing optical film, and display device

Polarizer and image display device

Polarizer and image display device

Optically anisotropic film, optical film, and display device

Liquid crystal composition, light absorption anisotropic layer, laminate, and image display device

Optical laminate, viewing angle control system, image display device

Liquid crystal composition, light absorption anisotropic film, laminate, and image display device

Liquid crystal composition, light absorption anisotropic film, laminate, and image display device

Liquid crystal composition, method for producing high-molecular weight liquid crystal compound, light absorption anisotropic film, laminate, and image display device

Liquid crystalline composition, side chain type polymer liquid crystalline compound, light absorption anisotropic film, laminate, and image display device

Composition, light reflecting film, luminance-improving film, backlight unit, and liquid crystal display device

Polarizer and image display device

Polarizer and image display device

Coloring composition, dichroic dye compound, light absorption anisotropic film, laminate, and image display device

Brightness enhancement film, optical sheet member, and liquid crystal display device

Coloring composition, light absorption anisotropic film, laminate, and image display device

MICRON TECHNOLOGY INC

Scribe structure for memory device

Method of forming a semiconductor device, and a photomask used therein

Scribe structure for memory device

AJINOMOTO KK

Yeast, yeast extract containing gamma-Glu-Abu, and a method for producing the same

Modified leucine dehydrogenase

Modified leucine dehydrogenase

HOSHINO WATARU

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

TSUBAKI HIDEAKI

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

TARUTANI SHINJI

Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method

NISHIUCHI HIROAKI

Yeast extract containing γ-Glu-X or γ-Glu-X-Gly and a method for producing the same