Inventor

TSUBAKI HIDEAKI

JP69 patents

⚠️ This page may combine multiple inventors who share the name “TSUBAKI HIDEAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSUBAKI HIDEAKI

FUJIFILM CORP

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

Method of forming patterns

Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method

Method of forming patterns

Pattern forming method

Resist composition for negative tone development and pattern forming method using the same

Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

Pattern forming method and electronic device manufacturing method

Pattern forming method, method for manufacturing electronic device, and laminate

Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device

Pattern forming method, method for manufacturing electronic device, and laminate

Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device

Rinsing liquid, pattern forming method, and electronic device manufacturing method

Developer, pattern forming method, and electronic device manufacturing method

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device

Method of forming patterns

Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Method of forming patterns

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound

TSUBAKI HIDEAKI

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Method of forming patterns

Method of forming patterns

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Resist composition for negative tone development and pattern forming method using the same

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays

Method of forming patterns

Method of forming patterns

Pattern forming method

TSUCHIMURA TOMOTAKA

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition

IWATO KAORU

Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device

TARUTANI SHINJI

Positive resist composition and pattern forming method

TSUCHIHASHI TORU

Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern

HIRANO SHUJI

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern