Inventor

MISAKA AKIO

JP52 patents

⚠️ This page may combine multiple inventors who share the name “MISAKA AKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MISAKA AKIO

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI

Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI

Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light

Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI

Photomask

Photomask

Photomask, method for producing the same, and method for forming pattern using the photomask

Photomask, method for forming the same,and method for designing mask pattern

Photomask

Dry-etching process simulator

Photomask and method for producing the same

Method for forming pattern using a photomask

Photomask and method for producing the same

Electron beam exposure evaluation method

Photomask

Photomask, method for forming the same, and method for forming pattern using the photomask

Pattern formation method

Photomask, method for producing the same, and method for forming pattern using the photomask

Method for producing photomask and method for producing photomask pattern layout

Method for forming pattern using photomask

Patterning method using a photomask

Photomask and pattern forming method

Mask pattern generating method and mask pattern generating apparatus

PANASONIC CORP

Mask data creation method

Semiconductor device and layout design method for the same

Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method

Photo mask and method for forming pattern using the same

Photomask

Photomask, pattern formation method using the same and mask data creation method

Photomask, fabrication method for the same and pattern formation method using the same

Mask data creation method

Pattern formation method

Pattern formation method

Photomask, method for producing the same, and method for forming pattern using the photomask

Method for forming generating mask data

Patterning method using photomask

Method for forming pattern

Photomask and pattern formation method using the same

Photomask and pattern formation method using the same

Photomask, and pattern formation method and exposure apparatus using the photomask

Photomask and pattern formation method using the same

SAMSUNG ELECTRONICS CO LTD

Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correction

Method of manufacturing a semiconductor device

Method and computing device for manufacturing semiconductor device

Layout method of semiconductor chip, semiconductor chip manufacturing method and computing device using same

Manufacturing methods of semiconductor devices

MISAKA AKIO

Semiconductor device and layout design method for the same

Changing a design rule for forming LSI pattern based on evaluating effectiveness of optical proximity corrected patterns

PANASONIC IP MAN CO LTD

Photomask, and method for creating pattern data thereof, and pattern forming method and processing method using photomask

TABATA YASUKO

Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method