Inventor
DMITRIEV VLADIMIR
IL30 patents
⚠️ This page may combine multiple inventors who share the name “DMITRIEV VLADIMIR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
DMITRIEV VLADIMIR
5 patentsUS9658527B2May 23, 2017
Correction of errors of a photolithographic mask using a joint optimization process
DMITRIEV VLADIMIR14 citations83
US9753366B2Sep 5, 2017
Method and apparatus for the determination of laser correcting tool parameters
DMITRIEV VLADIMIR4 citations72
US9207530B2Dec 8, 2015
Analyses of measurement data
DMITRIEV VLADIMIR2 citations57
US9606444B2Mar 28, 2017
Method and apparatus for locally deforming an optical element for photolithography
DMITRIEV VLADIMIR1 citations45
US8869076B2Oct 21, 2014
Global landmark method for critical dimension uniformity reconstruction
DMITRIEV VLADIMIR0 citations38
ZEISS CARL SMS LTD
5 patentsUS10353295B2Jul 16, 2019
Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer
ZEISS CARL SMS LTD3 citations71
US11366383B2Jun 21, 2022
Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask
ZEISS CARL SMS LTD0 citations52
US10114294B2Oct 30, 2018
Apparatus and method for imparting direction-selective light attenuation
ZEISS CARL SMS LTD0 citations51
US9798249B2Oct 24, 2017
Method and apparatus for compensating at least one defect of an optical system
ZEISS CARL SMS LTD0 citations51
US11914289B2Feb 27, 2024
Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask
ZEISS CARL SMS LTD0 citations44
ZEISS CARL SMT GMBH
4 patentsUS10061192B2Aug 28, 2018
Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
ZEISS CARL SMT GMBH6 citations82
US11366382B2Jun 21, 2022
Method and apparatus for performing an aerial image simulation of a photolithographic mask
ZEISS CARL SMT GMBH1 citations58
US11249294B2Feb 15, 2022
Optical system and method for correcting mask defects using the system
ZEISS CARL SMT GMBH0 citations48
US10578975B2Mar 3, 2020
Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography
ZEISS CARL SMT GMBH0 citations37
CREE RESEARCH INC
3 patentsUS5523589AJun 4, 1996
Vertical geometry light emitting diode with group III nitride active layer and extended lifetime
CREE RESEARCH INC1,058 citations98
US5338944AAug 16, 1994
Blue light-emitting diode with degenerate junction structure
CREE RESEARCH INC475 citations98
US5393993AFeb 28, 1995
Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices
CREE RESEARCH INC977 citations96