Inventor

RAVKIN MIKE

US50 patents

⚠️ This page may combine multiple inventors who share the name “RAVKIN MIKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RAVKIN MIKE

LAM RES CORP

Single wafer residue, thin film removal and clean

Vertical proximity processor

Capillary proximity heads for single wafer cleaning and drying

Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process

Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Methods for wafer proximity cleaning and drying

Apparatus and method for depositing and planarizing thin films of semiconductor wafers

Method for controlling galvanic corrosion effects on a single-wafer cleaning system

Apparatus and method for qualifying a chemical mechanical planarization process

End-point detection system for chemical mechanical posing applications

Drip manifold for uniform chemical delivery

Wafer scrubbing brush core

Wafer scrubbing brush core

Method and system for using a two-phases substrate cleaning compound

Method and apparatus for atomic layer deposition (ALD) in a proximity system

Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing

Single phase proximity head having a controlled meniscus for treating a substrate

Edge wheel dry manifold

Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Method and apparatus for cleaning a substrate using megasonic power

End-point detection apparatus

End-point detection system for chemical mechanical polishing applications

Reduction of entrance and exit marks left by a substrate-processing meniscus

Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus

System for cleaning a semiconductor wafer

System and apparatus for evaluating the effectiveness of wafer drying operations

Methods for evaluating advanced wafer drying techniques

Apparatus and method for depositing and planarizing thin films of semiconductor wafers

Method and apparatus for transporting a substrate using non-newtonian fluid

Multi-menisci processing apparatus

Method and apparatus for transporting a substrate using non-Newtonian fluid

Apparatus and method for qualifying a chemical mechanical planarization process

Method and apparatus for cleaning a substrate using non-Newtonian fluids

Controls of ambient environment during wafer drying using proximity head

Methods for atomic layer deposition (ALD) using a proximity meniscus

Methods for contained chemical surface treatment

Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids

Drip manifold for uniform chemical delivery

Substrate gripper with integrated electrical contacts

O'DONNELL ROBERT

Reduction of entrance and exit marks left by a substrate-processing meniscus

Reduction of entrance and exit marks left by a substrate-processing meniscus

Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus

Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus

DE LARIOS JOHN M

Method and apparatus for cleaning a substrate using non-newtonian fluids

Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids

KOROLIK MIKHAIL

Two-phase substrate cleaning material

Apparatus for cleaning contaminants from substrate

LAM RES AG

Method and apparatus for processing wafer-shaped articles

MAGNI ENRICO

Prevention of particle adders when contacting a liquid meniscus over a substrate

RAVKIN MIKE

Method for processing a substrate using a single phase proximity head having a controlled meniscus