Inventor

VOLKOVICH ROIE

IL35 patents

⚠️ This page may combine multiple inventors who share the name “VOLKOVICH ROIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VOLKOVICH ROIE

KLA TENCOR CORP

Method and system for selection of metrology targets for use in focus and dose applications

Method and apparatus for direct self assembly in target design and production

Focus measurements using scatterometry metrology

Method and system for process control with flexible sampling

Process and metrology control, process indicators and root cause analysis tools based on landscape information

Misregistration measurements using combined optical and electron beam technology

Polarization measurements of metrology targets and corresponding target designs

Method of measuring misregistration of semiconductor devices

Method of measuring misregistration of semiconductor devices

Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

Recipe optimization based zonal analysis

Polarization measurements of metrology targets and corresponding target designs

On-product derivation and adjustment of exposure parameters in a directed self-assembly process

Reducing device overlay errors

Identifying registration errors of DSA lines

Lithography systems with integrated metrology tools having enhanced functionalities

Data-driven misregistration parameter configuration and measurement system and method

Dynamic amelioration of misregistration measurement

KLA CORP

Device-like overlay metrology targets displaying Moiré effects

Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices

Metrology system and method for measuring diagonal diffraction-based overlay targets

System and method for analyzing a sample with a dynamic recipe based on iterative experimentation and feedback

System and method for error reduction for metrology measurements

Systems and methods for feedforward process control in the manufacture of semiconductor devices

Multiple-tool parameter set configuration and misregistration measurement system and method

Measurement of properties of patterned photoresist

Field-to-field corrections using overlay targets

Field-to-field corrections using overlay targets

Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof

Systems and methods for measurement of misregistration and amelioration thereof

Multiple-tool parameter set calibration and misregistration measurement system and method

Inter-step feedforward process control in the manufacture of semiconductor devices

Selection of regions of interest for measurement of misregistration and amelioration thereof

System and method for tilt calculation based on overlay metrology measurements