Inventor
MORIKITA SHINYA
JP25 patents
Patents
25 patentsUS9412618B2Aug 9, 2016
Pattern forming method
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US11251048B2Feb 15, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD2 citations71
US11145490B2Oct 12, 2021
Plasma processing method
TOKYO ELECTRON LTD2 citations71
US12400865B2Aug 26, 2025
Pulsed capacitively coupled plasma processes
TOKYO ELECTRON LTD0 citations62
US11545364B2Jan 3, 2023
Pulsed capacitively coupled plasma processes
TOKYO ELECTRON LTD0 citations62
US11081351B2Aug 3, 2021
Method of processing substrate, device manufacturing method, and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US12575351B2Mar 10, 2026
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations59
US12456626B2Oct 28, 2025
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations59
US11062882B2Jul 13, 2021
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations59
US12347645B2Jul 1, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations58
US10886138B2Jan 5, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations57
US10991551B2Apr 27, 2021
Cleaning method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations55
US7488689B2Feb 10, 2009
Plasma etching method
TOKYO ELECTRON LTD1 citations51
US11728176B2Aug 15, 2023
Treatment method
TOKYO ELECTRON LTD0 citations50
US11594398B2Feb 28, 2023
Apparatus and method for plasma processing
TOKYO ELECTRON LTD0 citations50
US10957515B2Mar 23, 2021
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations50
US10546723B2Jan 28, 2020
Plasma processing method
TOKYO ELECTRON LTD0 citations50
US10950458B2Mar 16, 2021
Etching method
TOKYO ELECTRON LTD0 citations48
US12488990B2Dec 2, 2025
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations47
US11569094B2Jan 31, 2023
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations45
US7387743B2Jun 17, 2008
Etching method and apparatus, computer program and computer readable storage medium
TOKYO ELECTRON LTD0 citations41
US10770268B2Sep 8, 2020
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations38
US10707088B2Jul 7, 2020
Method of processing target object
TOKYO ELECTRON LTD0 citations37
US10692726B2Jun 23, 2020
Method for processing workpiece
TOKYO ELECTRON LTD0 citations37
US10192750B2Jan 29, 2019
Plasma processing method
TOKYO ELECTRON LTD0 citations33