Inventor
ORII TAKEHIKO
JP63 patents
⚠️ This page may combine multiple inventors who share the name “ORII TAKEHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
42 patentsUS7402523B2Jul 22, 2008
Etching method
TOKYO ELECTRON LTD59 citations98
US7332055B2Feb 19, 2008
Substrate processing apparatus
TOKYO ELECTRON LTD42 citations96
US7543593B2Jun 9, 2009
Substrate processing apparatus
TOKYO ELECTRON LTD32 citations93
US7404407B2Jul 29, 2008
Substrate processing apparatus
TOKYO ELECTRON LTD21 citations93
US7171973B2Feb 6, 2007
Substrate processing apparatus
TOKYO ELECTRON LTD33 citations93
US6817790B2Nov 16, 2004
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD23 citations93
US6634806B2Oct 21, 2003
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD39 citations93
US9953826B2Apr 24, 2018
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD15 citations92
US6979655B2Dec 27, 2005
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD22 citations92
US6863741B2Mar 8, 2005
Cleaning processing method and cleaning processing apparatus
TOKYO ELECTRON LTD37 citations92
US6513537B1Feb 4, 2003
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD20 citations92
US7275553B2Oct 2, 2007
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD22 citations91
US7482281B2Jan 27, 2009
Substrate processing method
TOKYO ELECTRON LTD14 citations84
US7927429B2Apr 19, 2011
Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium
TOKYO ELECTRON LTD7 citations83
US7862680B2Jan 4, 2011
Substrate processing apparatus
TOKYO ELECTRON LTD6 citations74
US7300598B2Nov 27, 2007
Substrate processing method and apparatus
TOKYO ELECTRON LTD7 citations74
US10998183B2May 4, 2021
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
TOKYO ELECTRON LTD2 citations73
US10115609B2Oct 30, 2018
Separation and regeneration apparatus and substrate processing apparatus
TOKYO ELECTRON LTD6 citations73
US10046370B2Aug 14, 2018
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
TOKYO ELECTRON LTD3 citations73
US9662685B2May 30, 2017
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
TOKYO ELECTRON LTD5 citations73
US9583330B2Feb 28, 2017
Supercritical drying method for semiconductor substrate and supercritical drying apparatus
TOKYO ELECTRON LTD2 citations73
US11367630B2Jun 21, 2022
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD3 citations72
US10835908B2Nov 17, 2020
Substrate processing method
TOKYO ELECTRON LTD2 citations72
US10811283B2Oct 20, 2020
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD2 citations72
US10043652B2Aug 7, 2018
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD5 citations72
US9881784B2Jan 30, 2018
Substrate processing method, substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD4 citations72
US9799538B2Oct 24, 2017
Substrate cleaning system
TOKYO ELECTRON LTD6 citations72
US7354484B2Apr 8, 2008
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD7 citations72
US12538728B2Jan 27, 2026
Etching method and etching device
TOKYO ELECTRON LTD0 citations63
US11581192B2Feb 14, 2023
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations63
US10207349B2Feb 19, 2019
High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container
TOKYO ELECTRON LTD1 citations62
US9443712B2Sep 13, 2016
Substrate cleaning method and substrate cleaning system
TOKYO ELECTRON LTD2 citations62
US8794250B2Aug 5, 2014
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD3 citations62
US7803230B2Sep 28, 2010
Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method
TOKYO ELECTRON LTD5 citations62
US11011383B2May 18, 2021
Etching method
TOKYO ELECTRON LTD0 citations61
US7416632B2Aug 26, 2008
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD4 citations61
US6578592B1Jun 17, 2003
Processing apparatus with horizontally movable enclosing element
TOKYO ELECTRON LTD4 citations61
US12172198B2Dec 24, 2024
Gas cluster processing device and gas cluster processing method
TOKYO ELECTRON LTD0 citations58
US11594417B2Feb 28, 2023
Etching method and apparatus
TOKYO ELECTRON LTD0 citations58
US11267021B2Mar 8, 2022
Gas cluster processing device and gas cluster processing method
TOKYO ELECTRON LTD0 citations58
US11189498B2Nov 30, 2021
Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film
TOKYO ELECTRON LTD1 citations55
US8003509B2Aug 23, 2011
Semiconductor manufacturing apparatus and semiconductor manufacturing method
TOKYO ELECTRON LTD1 citations52
ORII TAKEHIKO
2 patentsTOSHIBA KK
2 patentsNANBA HIROMITSU
1 patentJI LINAN
1 patentHAYASHI HIDEKAZU
1 patentOHNO HIROKI
1 patentShowing the top 50 of 63 patents by PatentIndex Score.