Inventor
ISHIDA TOMOAKI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “ISHIDA TOMOAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
12 patentsUS5306671AApr 26, 1994
Method of treating semiconductor substrate surface and method of manufacturing semiconductor device including such treating method
MITSUBISHI ELECTRIC CORP89 citations96
US5246532ASep 21, 1993
Plasma processing apparatus
MITSUBISHI ELECTRIC CORP97 citations95
US5213658AMay 25, 1993
Plasma processing method
MITSUBISHI ELECTRIC CORP103 citations95
US5474615ADec 12, 1995
Method for cleaning semiconductor devices
MITSUBISHI ELECTRIC CORP25 citations92
US5240559AAug 31, 1993
Dry etching method of copper or copper alloy interconnection layer employing plasma of an iodine compound
MITSUBISHI ELECTRIC CORP33 citations92
US4915979AApr 10, 1990
Semiconductor wafer treating device utilizing ECR plasma
MITSUBISHI ELECTRIC CORP24 citations92
US4891095AJan 2, 1990
Method and apparatus for plasma treatment
MITSUBISHI ELECTRIC CORP23 citations91
US5318654AJun 7, 1994
Apparatus for cleaning a substrate with metastable helium
MITSUBISHI ELECTRIC CORP17 citations82
US4982138AJan 1, 1991
Semiconductor wafer treating device utilizing a plasma
MITSUBISHI ELECTRIC CORP19 citations81
US5147465ASep 15, 1992
Method of cleaning a surface
MITSUBISHI ELECTRIC CORP7 citations74
US5038013AAug 6, 1991
Plasma processing apparatus including an electromagnet with a bird cage core
MITSUBISHI ELECTRIC CORP8 citations74
US5846870ADec 8, 1998
Method of measuring a semiconductor device and a method of making a semiconductor device
MITSUBISHI ELECTRIC CORP4 citations60