Inventor
NISHIOKA KYUSAKU
JP7 patents
Patents
7 patentsUS4915979AApr 10, 1990
Semiconductor wafer treating device utilizing ECR plasma
MITSUBISHI ELECTRIC CORP24 citations92
US4877509AOct 31, 1989
Semiconductor wafer treating apparatus utilizing a plasma
MITSUBISHI ELECTRIC CORP43 citations92
US4891095AJan 2, 1990
Method and apparatus for plasma treatment
MITSUBISHI ELECTRIC CORP23 citations91
US4982138AJan 1, 1991
Semiconductor wafer treating device utilizing a plasma
MITSUBISHI ELECTRIC CORP19 citations81
US5070030ADec 3, 1991
Method of making an oxide isolated, lateral bipolar transistor
MITSUBISHI ELECTRIC CORP8 citations73
US4990991AFeb 5, 1991
Bipolar transistor and method of manufacturing the same
MITSUBISHI ELECTRIC CORP6 citations73
US5304775AApr 19, 1994
Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element
MITSUBISHI ELECTRIC CORP9 citations72