Inventor

ONISHI YASUNOBU

JP40 patents

⚠️ This page may combine multiple inventors who share the name “ONISHI YASUNOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ONISHI YASUNOBU

TOSHIBA KK

Composition for underlying film and method of forming a pattern using the film

Method of forming a pattern using polysilane

Method of forming a pattern

Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups

Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer

Polysilanes, polysiloxanes and silicone resist materials containing these compounds

A silicone resist materials containing a polysiloxane and a photo-sensitive agent

Polysilanes, Polysiloxanes and silicone resist materials containing these compounds

Resist composition for forming a pattern comprising a pyridinium compound as an additive

Topography simulation method

Manufacturing method of semiconductor device using mask pattern having high etching resistance

Method of forming pattern

Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer

Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive

Pattern formation resist and pattern formation method

Photosensitive composition

Photosensitive composition

Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol

Polysilane compound and photosensitive composition

Photopolymerizable epoxy resin composition

Method for forming resist patterns

Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist

Pattern forming method and method for manufacturing semiconductor device

Method for forming a pattern and method of manufacturing semiconductor device

Photosensitive composition having uniform concentration distribution of components and pattern formation method using the same

Method of forming a resist pattern

Pattern forming method utilizing first insulative and then conductive overlayer and underlayer

Method of forming a pattern

Photosensitive composition and method of forming a resist pattern with copolymer of polyvinyl phenol

Resist pattern forming method and manufacturing method of semiconductor device

Alkali soluble phenol polymer photosensitive composition

Method for forming pattern

Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device

Semiconductor device manufacturing method to form resist pattern

Pattern forming method and method of manufacturing semiconductor device

TOKYO SHIBAURA ELECTRIC CO

Photo-curable epoxy resin composition

Photo-curable epoxy resin composition

Photo-curable epoxy resin composition

Photocurable silicon compound composition

Organic photoconductive compositions for use in electrophotography