Inventor
HORIGUCHI RUMIKO
JP7 patents
Patents
7 patentsUS5198520AMar 30, 1993
Polysilanes, polysiloxanes and silicone resist materials containing these compounds
TOSHIBA KK97 citations96
US5017453AMay 21, 1991
A silicone resist materials containing a polysiloxane and a photo-sensitive agent
TOSHIBA KK81 citations96
US4822716AApr 18, 1989
Polysilanes, Polysiloxanes and silicone resist materials containing these compounds
TOSHIBA KK120 citations96
US5063134ANov 5, 1991
Photosensitive composition
TOSHIBA KK27 citations92
US4988601AJan 29, 1991
Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol
TOSHIBA KK36 citations92
US4871646AOct 3, 1989
Polysilane compound and photosensitive composition
TOSHIBA KK24 citations92
US4828958AMay 9, 1989
Photosensitive composition and method of forming a resist pattern with copolymer of polyvinyl phenol
TOSHIBA KK12 citations73