Inventor
HILLS GRAHAM W
US11 patents
⚠️ This page may combine multiple inventors who share the name “HILLS GRAHAM W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
7 patentsUS5685914ANov 11, 1997
Focus ring for semiconductor wafer processing in a plasma reactor
APPLIED MATERIALS INC516 citations98
US6125788AOct 3, 2000
Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter
APPLIED MATERIALS INC64 citations96
US5744049AApr 28, 1998
Plasma reactor with enhanced plasma uniformity by gas addition, and method of using same
APPLIED MATERIALS INC68 citations96
US5534108AJul 9, 1996
Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor
APPLIED MATERIALS INC52 citations96
US5410122AApr 25, 1995
Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers
APPLIED MATERIALS INC36 citations92
US5242538ASep 7, 1993
Reactive ion etch process including hydrogen radicals
APPLIED MATERIALS INC63 citations92
US5382316AJan 17, 1995
Process for simultaneous removal of photoresist and polysilicon/polycide etch residues from an integrated circuit structure
APPLIED MATERIALS INC89 citations91
AT & T BELL LAB
3 patentsUS5026666AJun 25, 1991
Method of making integrated circuits having a planarized dielectric
AT & T BELL LAB63 citations93
US4980301ADec 25, 1990
Method for reducing mobile ion contamination in semiconductor integrated circuits
AT & T BELL LAB7 citations69
US5057186AOct 15, 1991
Method of taper-etching with photoresist adhesion layer
AT & T BELL LAB16 citations68