Inventor

CHANG CHING-YU

TW453 patents

⚠️ This page may combine multiple inventors who share the name “CHANG CHING-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHANG CHING-YU

TAIWAN SEMICONDUCTOR MFG CO LTD

Silicon-containing photoresist for lithography

Semiconductor method of protecting wafer from bevel contamination

Photoresist developer and method of developing photoresist

Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern

EUV metallic resist performance enhancement via additives

Extreme ultraviolet photolithography method with developer composition

Pattern fidelity enhancement with directional patterning technology

Methods of reducing pattern roughness in semiconductor fabrication

Multi-layer photoresist

Porogen bonded gap filling material in semiconductor manufacturing

Extreme ultraviolet photoresist

Silicon-based middle layer composition

Photoresist and method of manufacture

CHANG CHING-YU

Apparatus and method for developing process

Photosensitive material and method of lithography

Photolithography material for immersion lithography processes

Method and material for forming a double exposure lithography pattern

Apparatus and method for immersion lithography

Water mark defect prevention for immersion lithography

TARC material for immersion watermark reduction

Surface switchable photoresist

TAIWAN SEMICONDUCTOR MFG

Photo resist baking in lithography process

Middle layer composition for trilayer patterning stack

Coating material and method for photolithography

Megasonic immersion lithography exposure apparatus and method

Surface switchable photoresist

Water mark defect prevention for immersion lithography

Water mark defect prevention for immersion lithography

Method and material for forming a double exposure lithography pattern

MACRONIX INT CO LTD

Method for pitch reduction

Method of fabricating non-volatile memory

Development method for manufacturing semiconductors

Method of removing a photoresist layer on a semiconductor wafer

Method of wafer reclaim

Method of forming a dual damascene structure by patterning a sacrificial layer to define the plug portions of the structure

Method of reducing film stress on overlay mark

Method of reducing charge loss for nonvolatile memory

WANG CHIEN-WEI

Patterning process and chemical amplified photoresist with a photodegradable base

Patterning process and photoresist with a photodegradable base

Patterning process and chemical amplified photoresist composition

LIN BURN JENG

Immersion lithography system using a sealed wafer bath

Immersion lithography system using direction-controlling fluid inlets

Immersion lithography system using a sealed wafer bath

DE HO WEI

Cut-mask patterning process for fin-like field effect transistor (FinFET) device

Patterning process for fin-like field effect transistor (finFET) device

EUMED BIOTECHNOLOGY CO LTD

Biosensor

UNITED MICROELECTRONICS CORP

Semiconductor device and method for fabricating the same

WU CHEN-HAU

Method and composition of a dual sensitive resist

LEE FONG-CHENG

Method and photoresist with zipper mechanism

WANG HSIEN-CHENG

Photoresist materials and photolithography processes