Inventor
SHIRAISHI MASAYUKI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “SHIRAISHI MASAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
23 patentsUS6441963B2Aug 27, 2002
Multi-layered mirror
NIKON CORP181 citations99
US6507641B1Jan 14, 2003
X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same
NIKON CORP78 citations96
US6295164B1Sep 25, 2001
Multi-layered mirror
NIKON CORP49 citations96
US6833223B2Dec 21, 2004
Multilayer-film reflective mirrors and optical systems comprising same
NIKON CORP33 citations92
US7382527B2Jun 3, 2008
EUV multilayer mirror with phase shifting layer
NIKON CORP17 citations91
US7948675B2May 24, 2011
Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods
NIKON CORP8 citations84
US7599112B2Oct 6, 2009
Multilayer-film mirrors, lithography systems comprising same, and methods for manufacturing same
NIKON CORP15 citations84
US7203275B2Apr 10, 2007
Multilayer film reflector and X-ray exposure system
NIKON CORP13 citations84
US6504900B2Jan 7, 2003
Optical sample X-ray testing apparatus and method for testing optical sample with X-rays
NIKON CORP16 citations84
US7491955B2Feb 17, 2009
EUV light source, EUV exposure system, and production method for semiconductor device
NIKON CORP7 citations74
US6843572B2Jan 18, 2005
Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same
NIKON CORP11 citations74
US7812928B2Oct 12, 2010
Exposure apparatus
NIKON CORP2 citations63
US7145987B2Dec 5, 2006
X-ray-generating devices and exposure apparatus comprising same
NIKON CORP5 citations63
US6728037B2Apr 27, 2004
Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same
NIKON CORP3 citations63
US7706058B2Apr 27, 2010
Multilayer mirror, method for manufacturing the same, and exposure equipment
NIKON CORP4 citations61
US7440182B2Oct 21, 2008
Multilayer mirror, method for manufacturing the same, and exposure equipment
NIKON CORP1 citations61
US12121991B2Oct 22, 2024
Processing apparatus, and manufacturing method of movable body
NIKON CORP0 citations59
US12539561B2Feb 3, 2026
Processing apparatus, processing method and processing system
NIKON CORP0 citations56
US9529251B2Dec 27, 2016
Flare-measuring mask, flare-measuring method, and exposure method
NIKON CORP0 citations52
US12157184B2Dec 3, 2024
Processing apparatus, and manufacturing method of movable body
NIKON CORP0 citations50
US12383981B2Aug 12, 2025
Processing apparatus, and manufacturing method of movable body
NIKON CORP0 citations49
US12208469B2Jan 28, 2025
Processing apparatus and method using irradiation apparatus having a partition member
NIKON CORP0 citations49
US12544854B2Feb 10, 2026
Processing apparatus, processing system, and manufacturing method of movable body
NIKON CORP0 citations45
SHIRAISHI MASAYUKI
5 patentsUS8421998B2Apr 16, 2013
Optical system, exposure apparatus, and method of manufacturing electronic device
SHIRAISHI MASAYUKI4 citations61
US8194322B2Jun 5, 2012
Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
SHIRAISHI MASAYUKI2 citations61
US9030645B2May 12, 2015
Illumination optical system, exposure apparatus, and exposure method
SHIRAISHI MASAYUKI1 citations51
US8945802B2Feb 3, 2015
Flare-measuring mask, flare-measuring method, and exposure method
SHIRAISHI MASAYUKI1 citations51
US8699014B2Apr 15, 2014
Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device producing method
SHIRAISHI MASAYUKI0 citations51