Inventor

WESTMORELAND DONALD L

US57 patents

⚠️ This page may combine multiple inventors who share the name “WESTMORELAND DONALD L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WESTMORELAND DONALD L

MICRON TECHNOLOGY INC

Mixed metal nitride and boride barrier layers

Plasmaless dry contact cleaning method using interhalogen compounds

Method of wafer cleaning, and system and cleaning solution regarding same

Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides

System for wafer cleaning

Vapor delivery system for solid precursors and method regarding same

Compositions and methods for removing etch residue

Film on a surface of a mold used during semiconductor device fabrication

Ruthenium and ruthenium dioxide removal method and material

Film on a surface of a mold used during semiconductor device fabrication

Chemical vapor deposition of titanium

Ruthenium and ruthenium dioxide removal method and material

Etch residue clean

Titanium/aluminum/nitrogen material for semiconductor devices

Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds

Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials

Method for binding halide-based contaminants during formation of a titanium-based film

Method for making sol gel spacers for flat panel displays

Mixed metal nitride and boride barrier layers

Surface modification method for molds used during semiconductor device fabrication

Ruthenium and ruthenium dioxide removal method and material

Ruthenium and ruthenium dioxide removal method and material

Etch residue clean with aqueous HF/organic solution

Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor

Chemical vapor deposition of titanium

Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor

Semiconductor processing method of etching insulating inorganic metal oxide materials and method of cleaning metals from the surface of semiconductor wafers

Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds

Chamber and cleaning process therefor

Templates including self-assembled block copolymer films

Method and system for binding halide-based contaminants

Methods for forming niobium and/or vanadium containing layers using atomic layer deposition

Systems and methods for the electrolytic removal of metals from substrates

Method of forming barrier layers

Chemical vapor deposition of titanium

Chemical vapor deposition of titanium

Chemical vapor deposition of titanium

Ruthenium and ruthenium dioxide removal method and material

Mold apparatus used during semiconductor device fabrication

Plasmaless dry contact cleaning method using interhalogen compounds

Apparatus having a titanium alloy layer

Chemical vapor deposition apparatus with liquid feed

Method and system for binding halide-based contaminants

MICRON SEMICONDUCTOR INC

Method and appartus for subliming precursors

High efficiency method for performing a chemical vapor deposition utilizing a nonvolatile precursor

Reductive elimination chemical vapor deposition processes utilizing organometallic precursor compounds in semiconductor wafer processing

Methods of chemical-mechanical polishing insulating inorganic metal oxide materials

DERDERIAN GARO J

Method and system for binding halide-based contaminants

Method and system for binding halide-based contaminants

SANDHU GURTEJ SINGH

Chemical vapor deposition of titanium