Inventor
HWANG JENG H
US23 patents
⚠️ This page may combine multiple inventors who share the name “HWANG JENG H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
20 patentsUS6692903B2Feb 17, 2004
Substrate cleaning apparatus and method
APPLIED MATERIALS INC414 citations97
US6071372AJun 6, 2000
RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
APPLIED MATERIALS INC69 citations95
US6893893B2May 17, 2005
Method of preventing short circuits in magnetic film stacks
APPLIED MATERIALS INC37 citations92
US6821907B2Nov 23, 2004
Etching methods for a magnetic memory cell stack
APPLIED MATERIALS INC36 citations92
US6482745B1Nov 19, 2002
Etching methods for anisotropic platinum profile
APPLIED MATERIALS INC36 citations92
US6368517B1Apr 9, 2002
Method for preventing corrosion of a dielectric material
APPLIED MATERIALS INC41 citations92
US6323132B1Nov 27, 2001
Etching methods for anisotropic platinum profile
APPLIED MATERIALS INC36 citations92
US6277762B1Aug 21, 2001
Method for removing redeposited veils from etched platinum
APPLIED MATERIALS INC24 citations92
US6277251B1Aug 21, 2001
Apparatus and method for shielding a dielectric member to allow for stable power transmission into a plasma processing chamber
APPLIED MATERIALS INC25 citations92
US6087265AJul 11, 2000
Method for removing redeposited veils from etched platinum
APPLIED MATERIALS INC16 citations92
US6037264AMar 14, 2000
Method for removing redeposited veils from etched platinum
APPLIED MATERIALS INC19 citations92
US5174856ADec 29, 1992
Method for removal of photoresist over metal which also removes or inactivates corrosion-forming materials remaining from previous metal etch
APPLIED MATERIALS INC64 citations91
US6919168B2Jul 19, 2005
Masking methods and etching sequences for patterning electrodes of high density RAM capacitors
APPLIED MATERIALS INC31 citations90
US6265318B1Jul 24, 2001
Iridium etchant methods for anisotropic profile
APPLIED MATERIALS INC30 citations89
US6436838B1Aug 20, 2002
Method of patterning lead zirconium titanate and barium strontium titanate
APPLIED MATERIALS INC48 citations86
US6541380B2Apr 1, 2003
Plasma etching process for metals and metal oxides, including metals and metal oxides inert to oxidation
APPLIED MATERIALS INC13 citations84
US6579796B2Jun 17, 2003
Method of etching platinum using a silicon carbide mask
APPLIED MATERIALS INC9 citations71
US6709609B2Mar 23, 2004
Plasma heating of a substrate with subsequent high temperature etching
APPLIED MATERIALS INC4 citations62
US6692648B2Feb 17, 2004
Method of plasma heating and etching a substrate
APPLIED MATERIALS INC5 citations62
US6730561B2May 4, 2004
Method of forming a cup capacitor
APPLIED MATERIALS INC1 citations51