Inventor

JOSHI SUBHASH M

US38 patents

⚠️ This page may combine multiple inventors who share the name “JOSHI SUBHASH M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JOSHI SUBHASH M

INTEL CORP

Self-aligned contacts

Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making same

Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making same

Self-aligned contacts

Edge arrangements for integrated circuit chips

Self-aligned contacts

Trench contact structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Self-aligned contacts

Self-aligned contacts

Pre-sculpting of Si fin elements prior to cladding for transistor channel applications

Transistor fabrication technique including sacrificial protective layer for source/drain at contact location

Source/drain contacts for non-planar transistors

Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making same

Thermo-mechanically robust C4 ball-limiting metallurgy to prevent failure due to die-package interaction and method of making same

Trench contact structures for advanced integrated circuit structure fabrication

Trench contact structures for advanced integrated circuit structure fabrication

Source/drain contacts for non-planar transistors

Self-aligned contacts

Self-aligned contacts

Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making same

Recessed workfunction metal in CMOS transistor gates

Self-aligned contacts

Pre-sculpting of Si fin elements prior to cladding for transistor channel applications

Non-planar transistors and methods of fabrication thereof

Pre-sculpting of Si fin elements prior to cladding for transistor channel applications

Self-aligned contacts

Source/drain contacts for non-planar transistors

Source/drain contacts for non-planar transistors

Fin sculpting and cladding during replacement gate process for transistor channel applications

BOHR MARK T

Self-aligned contacts

Self-aligned contacts

Self-aligned contacts

RACHMADY WILLY

Recessed workfunction metal in CMOS transistor gates

PRADHAN SAMEER S

Source/drain contacts for non-planar transistors

JOSHI SUBHASH M

Non-planar transistors and methods of fabrication thereof

DATTA MADHAV

Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making same