P

Inventor

WANG YAXIN

US33 patents
⚠️ This page may combine multiple inventors who share the name “WANG YAXIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

18 patents
US6624064B1Sep 23, 2003

Chamber seasoning method to improve adhesion of F-containing dielectric film to metal for VLSI application

APPLIED MATERIALS INC583 citations99
US6070551AJun 6, 2000

Deposition chamber and method for depositing low dielectric constant films

APPLIED MATERIALS INC135 citations99
US7473655B2Jan 6, 2009

Method for silicon based dielectric chemical vapor deposition

APPLIED MATERIALS INC430 citations98
US6833052B2Dec 21, 2004

Deposition chamber and method for depositing low dielectric constant films

APPLIED MATERIALS INC65 citations96
US6589610B2Jul 8, 2003

Deposition chamber and method for depositing low dielectric constant films

APPLIED MATERIALS INC53 citations96
US6475854B2Nov 5, 2002

Method of forming metal electrodes

APPLIED MATERIALS INC159 citations96
US6416823B2Jul 9, 2002

Deposition chamber and method for depositing low dielectric constant films

APPLIED MATERIALS INC61 citations96
US6383954B1May 7, 2002

Process gas distribution for forming stable fluorine-doped silicate glass and other films

APPLIED MATERIALS INC90 citations96
US6323119B1Nov 27, 2001

CVD deposition method to improve adhesion of F-containing dielectric metal lines for VLSI application

APPLIED MATERIALS INC59 citations96
US6440495B1Aug 27, 2002

Chemical vapor deposition of ruthenium films for metal electrode applications

APPLIED MATERIALS INC136 citations95
US6211065B1Apr 3, 2001

Method of depositing and amorphous fluorocarbon film using HDP-CVD

APPLIED MATERIALS INC100 citations95
US6479100B2Nov 12, 2002

CVD ruthenium seed for CVD ruthenium deposition

APPLIED MATERIALS INC61 citations94
US6511923B1Jan 28, 2003

Deposition of stable dielectric films

APPLIED MATERIALS INC42 citations92
US6413871B2Jul 2, 2002

Nitrogen treatment of polished halogen-doped silicon glass

APPLIED MATERIALS INC40 citations92
US6814814B2Nov 9, 2004

Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates

APPLIED MATERIALS INC22 citations91
US7413627B2Aug 19, 2008

Deposition chamber and method for depositing low dielectric constant films

APPLIED MATERIALS INC6 citations74
US7542132B2Jun 2, 2009

Raman spectroscopy as integrated chemical metrology

APPLIED MATERIALS INC7 citations71
US7910476B2Mar 22, 2011

Adhesion and minimizing oxidation on electroless CO alloy films for integration with low K inter-metal dielectric and etch stop

APPLIED MATERIALS INC3 citations62

NOBELL FOODS INC

4 patents

HUAWEI TECH CO LTD

4 patents

LAM RES CORP

4 patents

BEIJING XIAOMI MOBILE SOFTWARE CO LTD

2 patents

WANG YAXIN

1 patent